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METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS

  • US 20090268182A1
  • Filed: 04/14/2009
  • Published: 10/29/2009
  • Est. Priority Date: 04/16/2008
  • Status: Active Grant
First Claim
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1. A method of measuring a lithographic projection apparatus, the method comprising:

  • imaging a verification mark provided in a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark comprises at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.

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