LASER OPERATING PROCESS AND LASER DEVICE

• US 20090272724A1
• Filed: 05/01/2009
• Published: 11/05/2009
• Est. Priority Date: 05/02/2008
• Status: Active Grant

• Current Assignee: Leister Technologies AG
• Original Assignee: Leister Technologies AG
• Inventors: Gubler, Ulrich, Scheidt, Michael
• Granted Patent: US 8,653,406 B2
• Time in Patent Office: Days
• US Class Current: 219/121.640
• CPC Class Codes: B23K 26/0604 by a combination of beams
• CPC Class Codes: B23K 26/066 by using masks

Abstract

A device and a process for processing and/or joining work pieces via laser radiation, with an effective power laser and a pilot target laser that emit laser beams of different wavelengths, with the laser beams being directed at the work pieces by laser optics. Regarding the laser beams, by the laser optics that comprise at least one diffractive optical element (DOE) as a masking system, the beam pattern of the pilot target laser is adjusted to match the beam pattern of the effective laser beam. This is accomplished preferably by removing the pilot laser beam from the effective laser beam for part of the path length by dichroic mirrors, and by expanding the diverging pilot laser beam on said part of the path length by deflecting mirrors whose distance from the dichroic mirrors is variable.

Claims

1. A process for processing and/or joining work pieces by means of laser radiation, with an effective power laser and a pilot target laser that emit an effective laser beam and a pilot laser beam of different wavelengths, with the laser beams of the effective laser beam and of the pilot laser beam being imaged on the work pieces by means of laser optics with randomly selectable beam patterns that are superimposed and identical in terms of position and form, wherein the form of the beam patterns is determined with at least one diffractive optical element (DOE) that is integrated in the laser optics, either with one diffractive optical element being used for the two laser beams and, after the diffractive optical element, the smaller beam cross-section of the pilot laser beam being adjusted to match the larger beam cross-section of the effective laser beam, or with two differently designed diffractive optical elements being used, with one diffractive optical element being associated with each of the two laser beams, with said diffractive optical elements matching the beam cross-section of the pilot laser beam and the beam cross-section of the effective laser beam so that the size of the beam patterns on the work pieces is approximately the same.

2. A process as claimed in claim 1, wherein the pilot laser beam is separated from the effective laser beam for part of the path length between the diffractive optical element and the work pieces, and in that the cross-section of the pilot laser beam is enlarged after the separation.

3. A process as claimed in claim 1, wherein after the separation from the effective laser beam, the beam cross-section of the pilot laser beam is expanded by means of deflecting mirrors that are arranged at a distance from each other and whose distance from the deflection elements is variable, so that it matches the beam cross-section of the effective laser beam on the work pieces.

4. A process as claimed in claim 1, wherein the pilot laser beam is deflected by means of wavelength-dependent mirrors relative to the effective laser beam.

5. A device for processing and/or joining work pieces by means of laser radiation with an effective power laser and a pilot target laser that emit an effective laser beam and a pilot laser beam of different wavelengths, with laser optics directing the laser beams at the work pieces, and with the laser optics directing the laser beams of the effective laser beam and of the pilot laser beam, imaging said beams on the work pieces with superimposed beam patterns that are identical in terms of position and form, wherein, in order to determine the form of the beam patterns, the laser optics comprise at least one diffractive optical element (DOE) and, in order to determine a uniform size of the beam patterns, a beam expansion system preferably following the diffractive optical element, with the beam expansion system adjusting the size of the beam pattern of the pilot laser beam to match the size of the beam pattern of the effective laser beam.

6. A device as claimed in claim 5, wherein the diffractive optical element consists of a fixed, preferably etched diffractive optical element.

7. A device as claimed in claim 5, wherein the diffractive optical element consists of a variable, preferably electronically controllable diffractive optical element.

8. A device as claimed in claim 5, wherein the beam expansion system comprises beam deflection elements for separating the pilot laser beam from the effective laser beam for part of the path length between the diffractive optical element and the work pieces.

9. A device as claimed in claim 5, wherein the beam expansion system comprises beam expansion elements for enlarging the beam cross-section of the pilot laser beam.

10. A device as claimed in claim 8, wherein the removal from and/or the re-introduction into the effective laser beam of the pilot laser beam is performed with wavelength-dependent mirrors as beam deflection elements.

11. A device as claimed in claim 9, wherein after the removal, the expansion of the pilot laser beam is performed with two deflecting mirrors as expansion elements whose distance from the deflecting elements is variable.

12. A device as claimed in claim 5, wherein the laser optics comprise two diffractive optical elements of which one generates the beam pattern of the effective laser beam and the other generates the beam pattern of the pilot laser beam.

13. A device as claimed in claim 5, wherein the laser optics comprise a second diffractive optical element instead of the beam expansion system, with one diffractive optical element generating the beam pattern of the effective laser beam and the other generating the beam pattern of the pilot laser beam.

14. A device as claimed in claim 12, wherein the two diffractive elements are arranged side by side on a common carrier that is supported in the laser optics so that it can be shifted transversely relative to the effective laser beam or the pilot laser beam.

15. A device as claimed in any claim 12, wherein a fixed, preferably etched diffractive optical element or a variable, preferably electronically controllable diffractive optical element is provided for generating the beam pattern.