Segmented pillar layout for a high-voltage vertical transistor
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Abstract
In one embodiment, a transistor fabricated on a semiconductor die includes a first section of transistor segments disposed in a first area of the semiconductor die, and a second section of transistor segments disposed in a second area of the semiconductor die adjacent the first area. Each of the transistor segments in the first and second sections includes a pillar of a semiconductor material that extends in a vertical direction. First and second dielectric regions are disposed on opposite sides of the pillar. First and second field plates are respectively disposed in the first and second dielectric regions. Outer field plates of transistor segments adjoining first and second sections are either separated or partially merged.
94 Citations
46 Claims
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1-36. -36. (canceled)
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37. An apparatus comprising:
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a plurality of transistor segments arranged on a die, each transistor segment having a racetrack shape with a length elongated in a first lateral direction and a width in a second lateral direction, each transistor segment including; a pillar of a semiconductor material, the pillar including an extended drain region that extends in a vertical direction through the die; a first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar; first and second field plates respectively disposed in the first and second dielectric regions; wherein the transistor segments are arranged into a plurality of sections, a first section comprising a first row of transistor segments arranged in a side-by-side relationship in the second lateral direction, and a second section comprising a second row of transistor segments arranged in the side-by-side relationship in the second lateral direction, the second dielectric region of each transistor segment of the first section being merged, and the second dielectric region of each transistor segment of the second section being merged, the merged second dielectric region of the first section being separated in the first lateral direction from the merged second dielectric region of the second section by one or more dummy pillars of the semiconductor material. - View Dependent Claims (38, 39, 40, 41)
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42. An apparatus comprising:
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a plurality of transistor segments arranged on a die, each transistor segment having an elongated annular shape with a length elongated in a first lateral direction and a width in a second lateral direction, each transistor segment including; a pillar of a semiconductor material, the pillar including a drift region that extends in a vertical direction through the die; a first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar; first and second field plates respectively disposed in the first and second dielectric regions; wherein the transistor segments are arranged into a plurality of sections, a first section comprising a first row of transistor segments arranged in a side-by-side relationship in the second lateral direction with the second dielectric region of each transistor segment of the first section being merged, a second section comprising a second row of transistor segments arranged in the side-by-side relationship in the second lateral direction with the second dielectric region of each transistor segment of the second section being merged, the merged second dielectric region of the first section being separated from the merged second dielectric region of the second section in the first lateral direction by a dummy pillar of the semiconductor material.
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44. The apparatus of claim 43 wherein the first and second sections each extend in the second lateral direction substantially across a width of the die, the first section and the second section additively extending in the first lateral direction substantially across a length of the die.
- 45. The apparatus of claim 43 wherein the pillar further comprises a source region disposed near a top surface of the die, and a body region that vertically separates the source region from the extended drain region.
Specification