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Graphoepitaxial Self-Assembly of Arrays of Downward Facing Half-Cylinders

  • US 20090274887A1
  • Filed: 05/02/2008
  • Published: 11/05/2009
  • Est. Priority Date: 05/02/2008
  • Status: Active Grant
First Claim
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1. A method of forming a nanostructured polymer material on a substrate, comprising:

  • forming a self-assembling block copolymer material within a trench in a material layer on the substrate, the trench having a length, a neutral wetting floor, and opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer;

    applying a material preferentially wetting to the minority block over and in contact with the block copolymer material within the trench; and

    annealing the block copolymer material such that the block copolymer material self-assembles into half-cylindrical domains of the minority block of the block copolymer within a matrix of a majority block of the block copolymer, the half-cylindrical polymer domains oriented parallel to the trench floor and extending the length of the trench, the half-cylindrical domains having a face oriented toward and wetting the neutral wetting trench floor.

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