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METHOD AND SYSTEM FOR SEMICONDUCTOR PROCESS CONTROL AND MONITORING BY USING PCA MODELS OF REDUCED SIZE

  • US 20090276077A1
  • Filed: 02/18/2009
  • Published: 11/05/2009
  • Est. Priority Date: 04/30/2008
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • obtaining a plurality of historical measurement data sets, each of said plurality of historical measurement data sets related to a respective parameter set and measured during processing of semiconductor devices in a manufacturing environment;

    establishing a model for each respective parameter set by using a principal component analysis technique and a respective one of said plurality of measurement data sets related to said respective parameter set;

    obtaining a first measurement data set corresponding to a first parameter set of said parameter sets;

    obtaining a second measurement data set corresponding to a second parameter set of said parameter sets;

    applying a first model corresponding to said first parameter set to said first measurement data set;

    applying a second model corresponding to said second parameter set to said second measurement data set; and

    evaluating said first and second measurement data sets by combining a first statistical value set obtained from said first model and a second statistical value set obtained from said second model.

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