Quantum Photonic Imagers and Methods of Fabrication Thereof
1 Assignment
0 Petitions
Accused Products
Abstract
Emissive quantum photonic imagers comprised of a spatial array of digitally addressable multicolor pixels. Each pixel is a vertical stack of multiple semiconductor laser diodes, each of which can generate laser light of a different color. Within each multicolor pixel, the light generated from the stack of diodes is emitted perpendicular to the plane of the imager device via a plurality of vertical waveguides that are coupled to the optical confinement regions of each of the multiple laser diodes comprising the imager device. Each of the laser diodes comprising a single pixel is individually addressable, enabling each pixel to simultaneously emit any combination of the colors associated with the laser diodes at any required on/off duty cycle for each color. Each individual multicolor pixel can simultaneously emit the required colors and brightness values by controlling the on/off duty cycles of their respective laser diodes.
-
Citations
47 Claims
-
1-23. -23. (canceled)
-
24. A digital semiconductor structure for bonding to a two-dimensional multicolor light emitting pixel array comprising:
-
multiple two dimensional arrays of pixel logic cells; a digital control logic region positioned at the periphery of the array of pixels logic cells; a plurality of device contact pads positioned at the periphery of the digital control logic region; and a plurality of metal layers configured to; interconnect the array of pixels logic cells with the digital control logic region; connect the digital control logic region with the plurality of the device contact pads; and interconnect the array of pixel logic cells with a two-dimensional multicolor light emitting pixel array. - View Dependent Claims (25, 26, 27, 28, 29, 30)
-
-
31. A projector comprising:
-
an emissive multicolor digital image forming device in the form of a two dimensional array of multicolor laser emitting pixels; and a projection lens group coupled to the emissive aperture of the multicolor imager device to magnify the image size formed by the emissive multicolor digital image forming device. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
-
-
46. The method of making a two dimensional array of multicolor laser emitting pixels wherein each multicolor laser emitting pixel comprises a plurality of laser diode semiconductor structures, each for emitting a different color, stacked vertically with a grid of vertical sidewalls electrically and optically separating each multicolor pixel from adjacent multicolor pixels within the array of multicolor pixels, and a plurality of vertical waveguides optically coupled to the laser diode semiconductor structures to vertically emit laser light generated by the laser diode semiconductor structures from a first surface of the stack of laser diode semiconductor structures;
- the method comprising;
a) forming laser diode semiconductor structures of different colors, each having multiple semiconductor layers of one or more of the following semiconductors alloy materials;
AlxIn1-xP, (AlxGa1-x)yIn1-yP, GaxIn1-xP, AlxGa1-xN, AlxGa1-xN/GaN, InxGa1-xN, GaN, each formed on a separate wafer over a thick substrate layer of either GaAs, GaN or InGaN, each including an n-type etch-stop layer and a p-type contact layer of the same respective semiconductor substrate layer material type, each comprising n-type and p-type waveguide layers and cladding layers that define their respective optical confinement regions, each having at least one quantum well surrounded by two barrier layers that define their respective active regions, and each comprising an electron blocker layer embedded either within their respective p-type waveguide layers or between their respective p-type waveguide and cladding layers;b) depositing a SiO2 layer upon a Si-substrate wafer; c) depositing an n-contact metal layer over the SiO2 layer; d) wafer-level bonding of the p-type contact layer of a laser diode semiconductor structure wafer of one color to the deposited n-contact metal layer and etching its GaAs, GaN or InGaN thick substrate down to its n-type etch-stop layer; e) etching a grid of trenches with vertical sidewalls down to the n-contact metal layer and backfilling the etched trenches with SiO2; f) etching the trenches for vertical interconnect metal vias and backfilling etched trenches with metal; g) depositing a p-contact metal layer and etching the sidewall trenches; and h) depositing another SiO2 layer; i) repeating b) through h) for each additional color of laser diode semiconductor structure to be incorporated within the two dimensional array of multicolor laser emitting pixels; j) depositing and etching a metal layer to form contact pads and refilling etched gaps with SiO2; k) etching openings for the vertical waveguides though the Si-substrate side; l) depositing thin cladding layers on the interior walls of openings; and m) either backfilling the interior of the openings remaining internal to the thin cladding layers with a dielectric material of leaving then air filled.
- the method comprising;
-
47. A method of making emissive multicolor digital image forming devices comprising:
-
a) forming a wafer of two dimensional arrays of multicolor laser emitting pixels whereby each multicolor laser emitting pixel comprises a plurality of laser diode semiconductor structures, each for emitting a different color, stacked vertically with a grid of vertical sidewalls electrically and optically separating each multicolor pixel from adjacent multicolor pixels within the array of multicolor pixels, a plurality of vertical waveguides optically coupled to the laser diode semiconductor structures to vertically emit laser light generated by the laser diode semiconductor structures from a first surface of the stack of laser diode semiconductor structures, and a plurality of contact pads providing electrical contact to each laser diode semiconductor structure; b) forming a wafer of digital semiconductor structures, each having a plurality of digital semiconductor circuits in the respective digital semiconductor structure, each electrically coupled to receive control signals from the periphery of the digital semiconductor structure and electrically coupled to contact pads to separately control on/off states of each of the multicolor laser diode semiconductor structures that may be connected thereto; c) wafer-level bonding the wafer of two dimensional arrays of multicolor laser emitting pixels and the wafer of digital semiconductor structures contact pad side to contact pad side; d) etching through the photonic semiconductor structure of between pixel regions to expose the device contact pads; and e) cutting the multi wafer into dies to form multiple emissive multicolor digital image forming devices.
-
Specification