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METHOD AND APPARATUS FOR PULSED PLASMA PROCESSING USING A TIME RESOLVED TUNING SCHEME FOR RF POWER DELIVERY

  • US 20090284156A1
  • Filed: 05/13/2009
  • Published: 11/19/2009
  • Est. Priority Date: 05/14/2008
  • Status: Active Grant
First Claim
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1. An apparatus, comprising:

  • a first RF power supply having frequency tuning;

    a first matching network coupled to the first RF power supply; and

    a first common sensor for reading reflected RF power reflected back to the first RF power supply, the first common sensor coupled to the first RF power supply and the first matching network.

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