EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
First Claim
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1. An exposure apparatus, the apparatus comprising:
- a movable body which holds a mounted object and substantially moves along a predetermined plane;
a liquid supply device which supplies liquid on a surface of at least one of the object and the movable body on which the object is mounted;
a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of at least one of the object and the movable body, irradiates an energy beam on the object via the optical system and the liquid, and forms a pattern on the object; and
a measurement system which has a plurality of encoder heads each placed on a surface of the movable body, and out of the plurality of encoder heads, measures positional information of the movable body, based on measurement values of encoder heads located outside a liquid immersion area formed by the liquid.
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Abstract
In an exposure apparatus of a liquid immersion exposure method, a liquid immersion area is formed on the upper surface of a wafer by liquid supplied in a space formed with a projection optical system, and on a moving table holding the wafer, a plurality of encoder heads is placed. Of the plurality of encoder heads, a controller measures positional information of the moving table within an XY plane using an encoder head which is outside a liquid immersion area. This allows a highly precise and stable measurement of positional information of the moving table.
100 Citations
22 Claims
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1. An exposure apparatus, the apparatus comprising:
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a movable body which holds a mounted object and substantially moves along a predetermined plane; a liquid supply device which supplies liquid on a surface of at least one of the object and the movable body on which the object is mounted; a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of at least one of the object and the movable body, irradiates an energy beam on the object via the optical system and the liquid, and forms a pattern on the object; and a measurement system which has a plurality of encoder heads each placed on a surface of the movable body, and out of the plurality of encoder heads, measures positional information of the movable body, based on measurement values of encoder heads located outside a liquid immersion area formed by the liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An exposure method in which an energy beam is irradiated on an object via an optical system and liquid, and a pattern is formed on the object, the method comprising:
a measurement process in which of a plurality of encoder heads that are placed on a surface where the object is mounted of a movable body that substantially moves along a predetermined plane, positional information of the movable body is measured based on measurement values of encoder heads that face a grating section placed in parallel with the predetermined plane and are located outside a liquid immersion area formed with the liquid. - View Dependent Claims (17, 18, 19, 20, 21, 22)
Specification