Electrochromic devices having improved ion conducting layers

• US 20090285978A1
• Filed: 07/14/2009
• Published: 11/19/2009
• Est. Priority Date: 10/11/2005
• Status: Active Grant

• Current Assignee: Sage Electrochromics, Inc (Compagnie de Saint-Gobain SA)
• Original Assignee: Sage Electrochromics, Inc (Compagnie de Saint-Gobain SA)
• Inventors: Burdis, Mark Samuel, Weir, Douglas Glenn John, Greer, Bryan D.
• Granted Patent: US 8,004,744 B2
• Time in Patent Office: Days
• US Class Current: 427/69
• CPC Class Codes: G02F 1/1525 characterised by a particular ion transporting layer, e.g. electrolyte
• CPC Class Codes: G02F 2201/16 series; tandem

Abstract

An improved ion conductor layer for use in electrochromic devices and other applications is disclosed. The improved ion-conductor layer is comprised of at least two ion transport layers and a buffer layer, wherein the at least two ion transport layers and the buffer layer alternate within the ion conductor layer such that the ion transport layers are in communication with a first and a second electrode. Electrochromic devices utilizing such an improved ion conductor layer color more deeply by virtue of the increased voltage developed across the ion conductor layer prior to electronic breakdown while reducing the amount of electronic leakage. Also disclosed are methods of making electrochromic devices incorporating the improved ion conductor layer disclosed herein and methods of making ion conductors for use in other applications.

Claims

1. A method for the preparation of an electrochromic device comprising:

a) providing a first conductive layer,

b) depositing one of an electrochromic electrode layer and a counter electrode layer on said first conductive layer, thereby providing a first deposited electrode,

c) depositing an ion-conductor layer on said first deposited electrode, said ion-conductor layer comprising at least two ion transport layers and a buffer layer, said at least two ion transport layers and said buffer layer sequentially applied such that one of said at least two ion transport layers is in communication with said first deposited electrode,

d) depositing the other of said electrochromic electrode layer and said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode in communication with the other of said at least two ion transport layers, and

e) depositing a second conductive layer on said second deposited electrode.

2. The method of claim 1, including subsequently subjecting at least one of said first and second deposited electrodes to a heat treatment step.

3. The method of claim 2, comprising conducting said heat treatment step in a vacuum or an inert atmosphere.

4. The method of claim 1, comprising conducting said heat treatment step at a temperature ranging from about 40°

C. to about 550°

C.

5. The method of claim 4, wherein said temperature ranges from about 200°

C. to about 500°

C.

6. The method of claim 1, comprising depositing said first and second deposited electrodes by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, and wet chemical methods.

7. The method of claim 1, including reducing at least one of said first and second deposited electrodes by inserting ions thereinto.

8. The method of claim 7, wherein said reducing step is effected during said depositing of said first and second deposited electrodes.

9. The method of claim 7, wherein said ions are selected from the group consisting of lithium ions, sodium ions, and protons.

10. The method of claim 1, comprising depositing said at least two ion transport layers by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, wet chemical methods, laser ablation methods, sol-gel, metallo-organic decomposition, and magnetic sputtering.

11. The method of claim 1, comprising depositing said buffer layer by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, wet chemical methods, laser ablation methods, sol-gel, metallo-organic decomposition, and magnetic sputtering.

12. The method of claim 1, wherein adjacent ones of said at least two ion transport layers and buffer layer are comprised of different materials.

13. The method of claim 12, wherein said at least two ion transport layers are comprised of an insulator.

14. The method of claim 13, wherein said insulator is selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, titanium oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof.

15. The method of claim 12, wherein said buffer layer is comprised of a material selected from the group consisting of transparent lithium ion permeable materials and mixed conductors.

16. The method of claim 12, wherein said buffer layer is comprised of a material selected from the group consisting of tungsten oxides, nickel oxides, cerium oxides, molybdenum oxides, vanadium oxides, and mixtures thereof.

17. The method of claim 12, wherein said buffer layer is comprised of a material selected from the group consisting of WO₃, NiO, CeO₂, MoO₃, V₂O₅, and mixtures thereof.

18. The method of claim 12, wherein said buffer layer is comprised of a lithium-based ceramic material.

19. The method of claim 18, wherein said lithium-based ceramic material is selected from the group consisting of lithium silicates, lithium aluminum silicates, lithium aluminum borates, lithium borates, lithium silicon oxynitrides, lithium zirconium silicates, lithium niobates, lithium borosilicates, lithium phosphosilicates, lithium nitrides, lithium aluminum fluoride, and mixtures thereof.

20. A method of making an ion conductor layer comprising the steps of:

a) depositing a first ion transport layer onto a substrate;

b) depositing a buffer layer onto said first ion transport layer; and

c) depositing a second ion transport layer onto said buffer layer.

21. The method of claim 20, further comprising the steps of depositing additional ion transport and buffer layers onto said second ion transport layer, wherein said additional ion transport and buffer layers alternate within said ion conductor layer.

22. The method of claim 20 or 21, wherein adjacent ones of said first and second ion transport layers and said buffer layer are comprised of different materials.

23. The method of claim 22, wherein said first and second ion transport layers are comprised of an insulator.

24. The method of claim 23, wherein said insulator is selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, titanium oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof.

25. The method of claim 22, wherein said buffer layer is comprised of a material selected from the group consisting of transparent lithium ion permeable materials and mixed conductors.

26. The method of claim 22, wherein said buffer layer is comprised of a material selected from the group consisting of tungsten oxides, nickel oxides, cerium oxides, molybdenum oxides, vanadium oxides, and mixtures thereof.

27. The method of claim 22, wherein said buffer layer is comprised of a lithium-based ceramic material.

28. The method of claim 20 or 21, comprising depositing said first and second ion transport layers by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, wet chemical methods, laser ablation methods, sol-gel, metallo-organic decomposition, and magnetic sputtering.

29. The method of claim 20 or 21, comprising depositing said buffer layer by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, wet chemical methods, laser ablation methods, sol-gel, metallo-organic decomposition, and magnetic sputtering.

30. A method for the preparation of an electrochromic device comprising:

a) providing a first conductive layer,

b) depositing one of an electrochromic electrode layer and a counter electrode layer on said first conductive layer, thereby providing a first deposited electrode,

c) depositing an ion-conductor layer on said first deposited electrode, said ion-conductor layer comprising at least three ion transport layers and at least two buffer layers, said at least three ion transport layers and said at least two buffer layers alternate within said ion-conductor layer and are sequentially applied such that one of said at least three ion transport layers is in communication with said first deposited electrode,

d) depositing the other of said electrochromic electrode layer and said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode in communication with another of said at least three ion transport layers, and

e) depositing a second conductive layer on said second deposited electrode.

31. The method of claim 30, wherein said at least three ion transport layers are comprised of an insulator.

32. The method of claim 31, wherein said insulator is selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, titanium oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof.

33. The method of claim 30, wherein said insulator is selected from the group consisting of SiO₂, Al₂O₃, Nb₂O₃, Ta₂O₅, LiTaO₃, LiNbO₃, La₂TiO₇, La₂TiO₇, SrZrO₃, ZrO₂, Y2O₃, Nb₂O₅, La₂Ti₂O₇, LaTiO₃, HfO₂, and mixtures thereof.

34. The method of claim 31, wherein said insulator is a mixture of a silicon oxide and an aluminum oxide, wherein the amount of said silicon oxide to the amount of said aluminum oxide ranges from about 25:

1 to about 1;

25.

35. The method of claim 31, wherein said insulator is a mixture of a zirconium oxide and a yttrium oxide, wherein the amount of said zirconium oxide to the amount of said yttrium oxide ranges from about 25:

1 to about 1;

25.

36. The method of claim 31, wherein said insulator is mixed with an additive selected from the group consisting of metals and metal oxides.

37. The method of claim 30, wherein said buffer layer is comprised of a material selected from the group consisting of transparent lithium ion permeable materials and mixed conductors.

38. The method of claim 30, wherein said buffer layer is comprised of a material selected from the group consisting of tungsten oxides, nickel oxides, cerium oxides, molybdenum oxides, vanadium oxides, and mixtures thereof.

39. The method of claim 30, wherein said buffer layer is comprised of a material selected from the group consisting of WO₃, NiO, CeO₂, MoO₃, V₂O₅, and mixtures thereof.

40. The method of claim 30, wherein said buffer layer is comprised of a lithium-based ceramic material.

41. The method of claim 30, wherein said lithium-based ceramic material is selected from the group consisting of lithium silicates, lithium aluminum silicates, lithium aluminum borates, lithium borates, lithium silicon oxynitrides, lithium zirconium silicates, lithium niobates, lithium borosilicates, lithium phosphosilicates, lithium nitrides, lithium aluminum fluoride, and mixtures thereof.

42. The method of claim 38, wherein said buffer layer is a mixture of a nickel oxide and a tungsten oxide, wherein the amount of said nickel oxide to the amount of said tungsten oxide ranges from about 25:

1 to 1;

25.

43. The method of claim 30, wherein said buffer layer has a thickness ranging from about 10 nm to about 300 nm.