PLASMA PROCESS WITH PHOTORESIST MASK PRETREATMENT
First Claim
1. A method for etching features in a dielectric layer through a photoresist (PR) mask, the PR mask being patterned using laser light having a wavelength not more than 193 nm, said method comprising:
- pre-treating the PR mask with a noble gas plasma; and
providing a plurality of cycles, wherein each cycle comprises;
a deposition phase that deposits a deposition layer over the PR mask, the deposition layer covering a top and sidewalls of mask features of the PR mask; and
a shaping phase that shapes the deposition layer deposited over the PR mask.
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Accused Products
Abstract
A method for etching features in a dielectric layer through a photoresist (PR) mask is provided. The PR mask is patterned using laser light having a wavelength not more than 193 nm. The PR mask is pre-treated with a noble gas plasma, and then a plurality of cycles of a plasma process is provided. Each cycle includes a deposition phase that deposits a deposition layer over the PR mask, the deposition layer covering a top and sidewalls of mask features of the PR mask, and a shaping phase that shapes the deposition layer deposited over the PR mask.
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Citations
19 Claims
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1. A method for etching features in a dielectric layer through a photoresist (PR) mask, the PR mask being patterned using laser light having a wavelength not more than 193 nm, said method comprising:
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pre-treating the PR mask with a noble gas plasma; and providing a plurality of cycles, wherein each cycle comprises; a deposition phase that deposits a deposition layer over the PR mask, the deposition layer covering a top and sidewalls of mask features of the PR mask; and a shaping phase that shapes the deposition layer deposited over the PR mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An apparatus for etching features in a dielectric layer through a photoresist (PR) mask, the PR mask being patterned using laser light having a wavelength not more than 193 nm, the apparatus comprising:
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a plasma processing chamber, comprising; a chamber wall forming a plasma processing chamber enclosure; a substrate support for supporting a substrate within the plasma processing chamber enclosure; a pressure regulator for regulating the pressure in the plasma processing chamber enclosure; at least one electrode for providing power to the plasma processing chamber enclosure for sustaining a plasma; a gas inlet for providing gas into the plasma processing chamber enclosure; and a gas outlet for exhausting gas from the plasma processing chamber enclosure; a gas source in fluid connection with the gas inlet, comprising; an etch gas source; a deposition phase gas source; a shaping phase gas source; and a pretreatment gas source; and a controller controllably connected to the gas source and the at least one electrode, comprising; at least one processor; and computer readable media, comprising; computer readable code for pre-treating the PR mask with a noble gas plasma, comprising; computer readable code for providing a noble gas from the pretreatment gas source; computer readable code for forming a plasma from the noble gas; and computer readable code for stopping a flow of the noble gas; and computer readable code for providing a plurality of cycles, each cycle including a deposition phase and a shaping phase, the computer readable code comprising; computer readable code for providing a deposition phase gas from the deposition phase gas source; computer readable code for forming a plasma from the deposition phase gas so as to deposit a deposition layer over the PR mask, the deposition layer covering a top and sidewalls of mask features of the PR mask; computer readable code for stopping a flow of the deposition phase gas; computer readable code for providing a shaping phase gas from the shaping phase gas source; computer readable code for forming a plasma from the shaping phase gas so as to shape the deposition layer deposited over the PR mask; and computer readable code for stopping a flow of the shaping phase gas.
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Specification