Ethylene-tetrafluoroethylene phosphate composition
First Claim
Patent Images
1. A composition comprising a compound of formula (I) or (III):
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(A)w-P(O)(O−
M+)3-w
(I) or whereinA is Rf—
(CH2)k—
[(CF2CF)y—
(CH2CH2)z]mO and contains from about 8 to about 22 carbon atoms;
Rf is CnF2n+1;
n and k are each independently 1 to about 6;
y, z, and m are each independently 1, 2, 3, or mixture thereof;
w is 1 or 2 or a mixture thereof; and
M is hydrogen, ammonium ion, an alkali metal ion, or an alkanolammonium ion.
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Abstract
A composition comprising a compound of formula (I) or (II):
(A)w-P(O)(O−M+)3-w (I) or
wherein
- A is Rf—(CH2)k−[(CF2CF)y—(CH2CH2)z]mO and contains from about 8 to about 22 carbon atoms;
- Rf is CnF2n+1;
- n and k are each independently 1 to about 6;
- y, z, and m are each independently 1, 2, 3, or mixture thereof;
- w is 1 or 2 or a mixture thereof; and
- M is hydrogen, ammonium ion, an alkali metal ion, or an alkanolammonium ion.
21 Citations
18 Claims
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1. A composition comprising a compound of formula (I) or (III):
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(A)w-P(O)(O−
M+)3-w
(I) orwherein A is Rf—
(CH2)k—
[(CF2CF)y—
(CH2CH2)z]mO and contains from about 8 to about 22 carbon atoms;Rf is CnF2n+1; n and k are each independently 1 to about 6; y, z, and m are each independently 1, 2, 3, or mixture thereof; w is 1 or 2 or a mixture thereof; and M is hydrogen, ammonium ion, an alkali metal ion, or an alkanolammonium ion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 15, 16, 18)
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13. A method of providing resistance to blocking to a substrate having deposited thereon a coating composition comprising adding to the coating composition, prior to deposition on the substrate, a composition comprising one or more compounds of formula (I) or (II) or a mixture thereof:
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(A)w-P(O)(O−
M+)3-w
(I) orwherein A is Rf—
(CH2)k—
[(CF2CF)y—
(CH2CH2)z]mO and contains from about 8 to about 22 carbon atoms;Rf is CnF2n+1; n and k are each independently 1 to about 6; y, z, and m are each independently 1, 2, 3, or mixture thereof; w is 1 or 2 or a mixture thereof; and M is hydrogen, ammonium ion, an alkali metal ion, or an alkanolammonium ion. - View Dependent Claims (14, 17)
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Specification