GAS DELIVERY SYSTEM FOR AN ION SOURCE

• US 20090289197A1
• Filed: 12/19/2008
• Published: 11/26/2009
• Est. Priority Date: 01/03/2008
• Status: Active Grant

• Current Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Original Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Inventors: CASEY, Stefan, LINDBERG, Robert, KEEN, Kevin M., SLOCUM, John, CAMPBELL, Chris
• Granted Patent: US 8,003,954 B2
• Time in Patent Office: Days
• US Class Current: 250/424
• CPC Class Codes: H01J 2237/006 Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608
• CPC Class Codes: H01J 2237/061 Construction
• CPC Class Codes: H01J 2237/082 Electron beam
• CPC Class Codes: H01J 27/08 using arc discharge
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns
• CPC Class Codes: H01J 37/3171 for ion implantation plasma immersion ion implantation H01J37/32412

Abstract

An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features.

Claims

1. An ion source comprising:

an arc chamber having an electron-emitting element and a repeller; and

a manifold assembly defining a cavity and a gas outlet, said gas outlet configured to allow gas flow to said arc chamber, said gas outlet being closer to said repeller than said electron-emitting element.

2. The ion source of claim 1, wherein said electron-emitting element is an indirectly heated cathode.

3. The ion source of claim 1, further comprising a first crucible and a second crucible, said first crucible and said second crucible connected to said manifold assembly.

4. The ion source of claim 3, wherein each of said first crucible and said second crucible has a tamper-resistance means.

5. The ion source of claim 3, further comprising a wall at least partially disposed between said first crucible and said second crucible.

6. The ion source of claim 5, further comprising a cooling mechanism, wherein said cooling mechanism is configured to cool said wall.

7. The ion source of claim 6, wherein said wall defines a fluid passage and wherein said cooling mechanism provides a fluid to said fluid passage.

8. The ion source of claim 3, further comprising a lamp configured to heat at least one of said first crucible and said second crucible.

9. The ion source of claim 1, wherein said gas outlet is approximately 25% a distance between said electron-emitting element and said repeller.

10. The ion source of claim 1, wherein said gas outlet is less than approximately one inch from said repeller.

11. The ion source of claim 1, wherein said gas outlet is less than 2.5 inches from said repeller.

12. A method comprising:

providing an arc chamber with an electron-emitting element and a repeller and providing a gas outlet configured to allow gas flow to said arc chamber;

flowing a gas into said arc chamber closer to said repeller than said electron-emitting element; and

ionizing said gas in said arc chamber.

13. A crucible comprising:

a canister defining a cavity;

a crucible cap connected to said canister, said crucible cap defining an aperture and at least one hole;

a nozzle disposed in said aperture of said crucible cap, said nozzle having a rim inside said cavity disposed on said crucible cap configured to prevent said nozzle from being withdrawn through said aperture; and

at least one pin disposed in said hole of said crucible cap, said pin configured to secure said crucible cap to said canister.

14. The crucible of claim 13, wherein said crucible further comprises a plug disposed on said nozzle opposite said rim, said plug composed of vinyl.

15. The crucible of claim 13, wherein said crucible further comprises a shipping cap disposed over said nozzle.

16. The crucible of claim 13, wherein said nozzle is selected from the group consisting of tungsten and stainless steel.

17. The crucible of claim 13, wherein said pin is stainless steel.

18. The crucible of claim 13, wherein said crucible cap has threads for engagement with said canister.

19. The crucible of claim 13, wherein said nozzle has threads for engagement with said crucible cap.