STAGE UNIT FOR SUPPORTING A SUBSTRATE AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
First Claim
1. A stage for supporting a substrate, comprising:
- a body on which the substrate is positioned, the body including a plate having an electrode member therein and a tube protruded from a bottom surface of the plate and through which wirings are extended from the electrode member; and
a first insulation section inserted into the tube and having a plurality of first holes through which the wirings are inserted, respectively.
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Accused Products
Abstract
In a stage for supporting a substrate, a body, a base plate and a buffer are provided in the stage. The body on which the substrate is positioned includes a plate having a heating electrode for generating heat therein and a tube protruded from a bottom surface of the plate. The body is mounted on the base plate. The buffer is interposed between the base plate and the tube and has a thermal expansion ratio higher than that of the tube of the body and lower than that of the base plate. Accordingly, thermal expansion of the base plate may be absorbed by the buffer and may not have direct effect on the body. Therefore, the body may be prevented from being damaged due to the thermal expansion of the base plate.
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Citations
17 Claims
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1. A stage for supporting a substrate, comprising:
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a body on which the substrate is positioned, the body including a plate having an electrode member therein and a tube protruded from a bottom surface of the plate and through which wirings are extended from the electrode member; and a first insulation section inserted into the tube and having a plurality of first holes through which the wirings are inserted, respectively. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A stage for supporting a substrate, comprising:
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a body on which the substrate is positioned, the body including a plate having a heating electrode for generating heat therein and a tube protruded from a bottom surface of the plate; a base plate on which the body is mounted; and a buffer interposed between the base plate and the tube and having a thermal expansion ratio higher than that of the tube of the body and lower than that of the base plate. - View Dependent Claims (14)
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15. An apparatus for processing a substrate, comprising:
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a process chamber having a space in which the substrate is processed; a gas supplier connected to the process chamber and through which process gases for processing the substrate is supplied into the process chamber; and a stage positioned in the process chamber and supporting the substrate, wherein the stage includes; a body on which the substrate is positioned, the body including a plate having an electrode member therein and a tube protruded from a bottom surface of the plate and through which wirings are extended from the electrode member; and a first insulation section inserted into the tube and having a plurality of first holes through which the wirings are inserted, respectively. - View Dependent Claims (16, 17)
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Specification