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FILM FORMING SYSTEM AND METHOD FOR FORMING FILM

  • US 20090297706A1
  • Filed: 03/10/2006
  • Published: 12/03/2009
  • Est. Priority Date: 03/16/2005
  • Status: Abandoned Application
First Claim
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1. A film forming system that forms a film by vaporizing a liquid precursor and then depositing the vaporized liquid precursor on a substrate, comprisinga chamber inside of which the substrate is held and an injection valve that directly injects the liquid precursor into the chamber, whereinthe liquid precursor is a mixed solution composed of a metallic compound and a low boiling point organic compound, anda pressure in the chamber is made to be larger than a vapor pressure of the metallic compound prior to being mixed with the low boiling point organic compound and smaller than a vapor pressure of the mixed solution.

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