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MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS

  • US 20090300573A1
  • Filed: 05/29/2009
  • Published: 12/03/2009
  • Est. Priority Date: 06/03/2008
  • Status: Active Grant
First Claim
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1. A method for lithographic process simulation comprising:

  • maintaining a differential model that describes differences in imaging results attributable to differences in lithographic process parameters; and

    generating simulated wafer contours using the the differential model.

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