PLATING APPARATUS AND PLATING METHOD
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Abstract
A plating apparatus has an ashing unit (300) configured to perform an ashing process on a resist (502) applied on a surface of a seed layer (500) formed on a substrate (W), and a pre-wetting section (26) configured to provide hydrophilicity to a surface of the substrate after the ashing process. The plating apparatus includes a pre-soaking section (28) configured to bring the surface of the substrate into contact with a treatment solution to clean or activate a surface of the seed layer formed on the substrate. The plating apparatus also includes a plating unit (34) configured to bring the surface of the substrate into a plating solution in a plating tank while the resist is used as a mask so as to form a plated film (504) on the surface of the seed layer formed on the substrate.
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Citations
61 Claims
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1-60. -60. (canceled)
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61. A plating apparatus comprising:
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a loading/unloading section configured to load and unload a cassette housing substrates; a sensor provided in said loading/unloading section for detecting sizes of the substrates received in the cassette; a plurality of tools corresponding to sizes of substrates to be plated; a tool stocker to store said plurality of tools; a plating section configured to perform at least a plating process; a controller configured to select a tool corresponding to a size detected by said sensor from said plurality of tools; and a transfer device configured to hold and transfer said tool selected by said controller to said plating section.
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Specification