Method for Structuring a Device Layer of a Substrate
First Claim
1. Method for structuring a device layer of a substrate, wherein the substrate comprises a carrier layer, the device layer and an intermediate layer disposed between the carrier layer and the device layer, and wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer, wherein, starting from a second surface of the carrier layer opposing the first surface, the thickness of the device layer is reduced to a predetermined thickness at those positions where the intermediate layer is removed.
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Abstract
Method for structuring a device layer of a substrate, wherein the substrate includes a carrier layer, the device layer and an intermediate layer disposed between the carrier layer and the device layer. Thereby, the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer. Starting from a second surface of the carrier layer opposing the first surface, the thickness of the device layer is reduced to a predetermined thickness at those positions where the intermediate layer is removed.
14 Citations
21 Claims
- 1. Method for structuring a device layer of a substrate, wherein the substrate comprises a carrier layer, the device layer and an intermediate layer disposed between the carrier layer and the device layer, and wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer, wherein, starting from a second surface of the carrier layer opposing the first surface, the thickness of the device layer is reduced to a predetermined thickness at those positions where the intermediate layer is removed.
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16. A method for producing a micromechanical structure, comprising:
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providing a substrate comprising a device layer, a carrier layer and an intermediate layer disposed between the device layer and the carrier layer, wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer; and generating a micromechanical structure in the device layer of the substrate, wherein generating the micromechanical structure comprises reducing the thickness of the device layer to a predetermined thickness in at least one area of the micromechanical structure according to a method for structuring a device layer of a substrate, wherein the substrate comprises a carrier layer, the device layer and an intermediate layer disposed between the carrier layer and the device layer, and wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer, wherein, starting from a second surface of the carrier layer opposing the first surface, the thickness of the device layer is reduced to a predetermined thickness at those positions where the intermediate layer is removed.
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17. Micromechanical structure, comprising:
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a substrate comprising a device layer, a carrier layer and an intermediate layer disposed between the device layer and the carrier layer, wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer; and at least one portion in the area of the micromechanical structure, wherein the thickness of the device layer is reduced according to a method for structuring a device layer of a substrate, wherein the substrate comprises a carrier layer, the device layer and an intermediate layer disposed between the carrier layer and the device layer, and wherein the intermediate layer is structured for exposing, at least in one portion, a first surface of the carrier layer facing the device layer, wherein, starting from a second surface of the carrier layer opposing the first surface, the thickness of the device layer is reduced to a predetermined thickness at those positions where the intermediate layer is removed. - View Dependent Claims (18, 19, 20, 21)
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Specification