Structure Model description and use for scatterometry-based semiconductor manufacturing process metrology
First Claim
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1. A method comprising:
- accessing a structure model defining a cross-sectional profile of a structure on a sample, the cross-sectional profile at least partially defined using a set of blocks, each of the blocks including a plurality of vertices, each vertex expressed using at least one algebraic relationship between a plurality of parameters corresponding to the structure;
evaluating information from the structure model to produce expected metrology data for a scatterometry-based optical metrology;
accessing measured metrology data, the measured metrology data determined by examining the structure on the sample using the scatterometry-based optical metrology; and
comparing the expected metrology data and the measured metrology data in order to determine at least one of the plurality of parameters corresponding to the structure.
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Abstract
A method includes accessing a structure model defining a cross-sectional profile of a structure on a sample. The cross-sectional profile is at least partially defined using a set of blocks. Each of the blocks includes a number of vertices. One or more of the vertices are expressed using one or more algebraic relationships between a number of parameters corresponding to the structure. Information is evaluated from the structure model to produce expected metrology data for a scatterometry-based optical metrology. The expected metrology data is suitable for use for determining one or more of the number of parameters corresponding to the structure. Apparatus are also disclosed.
36 Citations
12 Claims
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1. A method comprising:
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accessing a structure model defining a cross-sectional profile of a structure on a sample, the cross-sectional profile at least partially defined using a set of blocks, each of the blocks including a plurality of vertices, each vertex expressed using at least one algebraic relationship between a plurality of parameters corresponding to the structure; evaluating information from the structure model to produce expected metrology data for a scatterometry-based optical metrology; accessing measured metrology data, the measured metrology data determined by examining the structure on the sample using the scatterometry-based optical metrology; and comparing the expected metrology data and the measured metrology data in order to determine at least one of the plurality of parameters corresponding to the structure. - View Dependent Claims (2, 3)
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4. A metrology system comprising:
a processing element configured to access a structure model defining a cross-sectional profile of a structure on a sample, the cross-sectional profile at least partially defined using a set of blocks, each of the blocks including a plurality of vertices, each vertex expressed using at least one algebraic relationship between a plurality of parameters corresponding to the structure, the processing element further configured to evaluate information from the structure model to produce expected metrology data for a scatterometry-based optical metrology, the processing element also configured to access measured metrology data, the measured metrology data determined by examining the structure on the sample using the scatterometry-based optical metrology, and the processing element further configured to compare the expected metrology data and the measured metrology data in order to determine at least one of the plurality of parameters corresponding to the structure. - View Dependent Claims (5, 6)
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7. A method comprising:
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accessing a structure model defining a cross-sectional profile of a structure on a sample, the cross-sectional profile at least partially defined using a set of blocks, each of the blocks including a plurality of vertices, at least one of the vertices expressed using at least one algebraic relationship between a plurality of parameters corresponding to the structure; and evaluating information from the structure model to produce expected metrology data for a scatterometry-based optical metrology, the expected metrology data suitable for use for determining at least one of the plurality of parameters corresponding to the structure. - View Dependent Claims (8, 9)
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10. A metrology system comprising:
a processing element configured to access a structure model defining a cross-sectional profile of a structure on a sample, the cross-sectional profile at least partially defined using a set of blocks, each of the blocks including a plurality of vertices, at least one of the vertices expressed using at least one algebraic relationship between a plurality of parameters corresponding to the structure, wherein the processing element is further configured to evaluate information from the structure model to produce expected metrology data for a scatterometry-based optical metrology, the expected metrology data suitable for use for determining at least one of the plurality of parameters corresponding to the structure. - View Dependent Claims (11, 12)
Specification