BAFFLE PLATE AND SUBSTRATE PROCESSING APPARATUS
First Claim
1. A baffle plate provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, the baffle plate having a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber,wherein the baffle plate has a stacked structure including a plurality of plate-shaped members, and the baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.
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Accused Products
Abstract
A baffle plate, provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, has a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber. The baffle plate has a stacked structure including a plurality of plate-shaped members. The baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.
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Citations
17 Claims
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1. A baffle plate provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, the baffle plate having a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber,
wherein the baffle plate has a stacked structure including a plurality of plate-shaped members, and the baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.
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9. A substrate processing apparatus comprising:
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a processing chamber in which a substrate is processed; a mounting table disposed in the processing chamber to mount the substrate thereon; a processing gas supply mechanism configured to supply a processing gas into the processing chamber; and a baffle plate disposed around the mounting table, the baffle plate having a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber, wherein the baffle plate has a stacked structure including a plurality of plate-shaped members, and the baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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Specification