METHODS FOR PROCESSING SUBSTRATES COMPRISING METALLIC NANOPARTICLES

• US 20090314628A1
• Filed: 06/20/2008
• Published: 12/24/2009
• Est. Priority Date: 06/20/2008
• Status: Active Grant

• Current Assignee: Baxter Healthcare SA (Baxter International Inc.), Baxter International Inc.
• Original Assignee: Baxter Healthcare SA (Baxter International Inc.), Baxter International Inc.
• Inventors: Yardimci, Ozlem, Bloss, Jeffrey, Lee, Yann-Per, Green, John-Bruce D.
• Granted Patent: US 8,753,561 B2
• Time in Patent Office: Days
• US Class Current: 204/164
• CPC Class Codes: C08J 2321/00 Characterised by the use of unspecified rubbers
• CPC Class Codes: C08J 7/123 Treatment by wave energy or particle radiation C08J7/18 takes precedence

Abstract

Methods for processing substrate surfaces comprising metallic nanoparticles are disclosed. The methods involve providing a substrate surface comprising metallic nanoparticles, and exposing the substrate surface to a plasma.

Claims

1. A method for processing a substrate comprising metallic nanoparticles comprising:

providing a substrate surface comprising metallic nanoparticles, and exposing the substrate surface to a plasma.

2. The method of claim 1, wherein the substrate surface comprises at least one plastic, glass, metal, ceramic, elastomer, or mixtures or laminates thereof.

3. The method of claim 1, wherein the substrate surface comprises a plastic or elastomer selected from the group consisting of:

acrylonitrile butadiene styrenes, polyacrylonitriles, polyamides, polycarbonates, polyesters, polyetheretherketones, polyetherimides, polyethylenes, polyethylene terephthalates, polylactic acids, polymethyl methyacrylates, polypropylenes, polystyrenes, polyurethanes, poly(vinyl chlorides), polyvinylidene chlorides, polyethers, polysulfones, silicones, natural rubbers, synthetic rubbers, styrene butadiene rubbers, ethylene propylene diene monomer rubbers, polychloroprene rubbers, acrylonitrile butadiene rubbers, chlorosuphonated polyethylene rubbers, polyisoprene rubbers, isobutylene-isoprene copolymeric rubbers, chlorinated isobutylene-isoprene copolymeric rubbers, brominated isobutylene-isoprene copolymeric rubbers, and mixtures and copolymers thereof.

4. The method of claim 1, wherein the substrate surface comprises a surface of a medical device or medical device component.

5. The method of claim 1, wherein the substrate surface comprises a surface of a medical fluid container or medical fluid flow system.

6. The method of claim 1, wherein the substrate surface comprises a surface of an I.V. set.

7. The method of claim 1, wherein the substrate surface comprises a surface of a medical device or medical device component selected from the group consisting of:

I.V. tubing, I.V. fluid bags, access devices for I.V. sets, septa, stopcocks, I.V. set connectors, I.V. set adaptors, clamps, I.V. filters, catheters, needles, and cannulae.

8. The method of claim 1, wherein the substrate surface comprises a surface of a luer access device or a needleless luer access device.

9. The method of claim 1, wherein the metallic nanoparticles comprise an antimicrobial metallic nanoparticle coating.

10. The method of claim 1, wherein the metallic nanoparticles comprise silver, copper, gold, zinc, cerium, platinum, palladium, tin, or mixtures thereof.

11. The method of claim 1, wherein the metallic nanoparticles comprise silver.

12. The method of claim 1, wherein the metallic nanoparticles have an initial diameter of about 1 nm to about 1000 nanometers.

13. The method of claim 1, wherein the plasma is generated at a pressure of about 0.001 Torr to about 760 Torr.

14. The method of claim 1, comprising exposing the substrate surface to the plasma for about 1 second to about 2 hours.

15. The method of claim 1, wherein the plasma is generated from an inert gas, a reactive gas, or mixtures thereof.

16. The method of claim 1, wherein the plasma is generated from helium, neon, argon, krypton, xenon, or mixtures thereof.

17. The method of claim 1, wherein the plasma is generated from air, oxygen, hydrogen peroxide, nitrogen, hydrogen chloride, hydrogen bromide, fluorine, chlorine, bromine, iodine, halogenated hydrocarbons, ammonia, or mixtures thereof.

18. The method of claim 1, wherein the plasma comprises a plasma selected from the group consisting of:

helium plasmas, neon plasmas, argon plasmas, krypton plasmas, xenon plasmas, air plasmas, oxygen plasmas, hydrogen peroxide plasmas, nitrogen plasmas, halogen plasmas, ammonia plasmas, and mixture thereof.

19. The method of claim 1, wherein the plasma comprises a halogen plasma selected from the group consisting of:

hydrogen chloride plasmas, hydrogen bromide plasmas, fluorine plasmas, chlorine plasmas, bromine plasmas, iodine plasmas, plasmas of halogenated hydrocarbons, and mixture thereof.

20. The method of claim 1, wherein the exposing comprises positioning the substrate surface in a process chamber, introducing a process gas into the process chamber, and generating the plasma.

21. The method of claim 20, wherein the plasma is generated using about 0.05 watts to about 30,000 watts of power.

22. The method of claim 20, wherein the plasma is generated using about 0.5 watts to about 5,000 watts of power.