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ATOMIC LAYER DEPOSITION FOR FUNCTIONALIZING COLLOIDAL AND SEMICONDUCTOR PARTICLES

  • US 20090315016A1
  • Filed: 06/16/2009
  • Published: 12/24/2009
  • Est. Priority Date: 06/17/2008
  • Status: Active Grant
First Claim
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1. A method for preparing a functionalized nanocomposite, comprising:

  • providing an atomic layer deposition (ALD) system;

    providing a colloidal quantum dot array comprising a semiconductor material;

    providing a first precursor reactive with the semiconductor material, the first precursor comprising at least one of a metal and a metal compound, and the first precursor selected to modify at least one of an electrical and an optical property of the colloidal quantum dot array; and

    exposing the colloidal quantum dot array to the first precursor within the ALD system for a first period, thereby depositing a monolayer of the first precursor over at least a portion of the semiconductor material to form a nanocomposite comprising an inorganic surface disposed over at least a portion of the semiconductor material.

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