High-voltage vertical transistor structure
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Abstract
In one embodiment, a transistor includes a pillar of semiconductor material arranged in a racetrack-shaped layout having a substantially linear section that extends in a first lateral direction and rounded sections at each end of the substantially linear section. First and second dielectric regions are disposed on opposite sides of the pillar. First and second field plates are respectively disposed in the first and second dielectric regions. First and second gate members respectively disposed in the first and second dielectric regions are separated from the pillar by a gate oxide having a first thickness in the substantially linear section. The gate oxide being substantially thicker at the rounded sections. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure.
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Citations
26 Claims
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1-15. -15. (canceled)
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16. A high-voltage transistor comprising:
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a pillar of semiconductor material arranged on a die in an annular layout having first and second substantially linear portions that extend in a first lateral direction and first and second rounded end portions that connect the first and second substantially linear portions at respective opposite ends of the annular layout, the pillar including a drift region that that extends in a vertical direction through the die; first and second dielectric regions disposed on opposite sides of the pillar, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar; first and second field plates respectively disposed in the first and second dielectric regions; first and second gate members respectively disposed in the first and second dielectric regions on opposite sides of the first substantially linear portion of the pillar; third and fourth gate members respectively disposed in the first and second dielectric regions on opposite sides of the second substantially linear portion of the pillar; and wherein the first, second, third, and fourth gate members terminate at or near the first and second rounded end portions such that the first and second rounded end portions are devoid of gate members. - View Dependent Claims (17, 18, 19, 20, 21)
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22. A high-voltage transistor device comprising:
a plurality of transistor segments, each transistor segment being arranged on a die in an annular layout, each transistor segment including; a pillar of semiconductor material having the annular layout with a length elongated in a first lateral direction and a width in a second lateral direction substantially orthogonal to the first lateral direction, the pillar having first and second substantially linear portions that extend in the first lateral direction and first and second rounded end portions that connect the first and second substantially linear portions at respective opposite ends, the pillar including a source region disposed at or near a surface of the pillar, a drift region that that extends in a vertical direction through the die, and a body region that separates the source region from the drift region; first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar; first and second gate members respectively disposed in the first and second dielectric regions at or near a top of the pillar, the first and second gate members being separated from the first and second substantially linear portions of the pillar by a gate oxide having a first thickness, the first and second gate members being separated from the pillar by a second thickness at the first and second rounded portions, the second thickness being substantially larger than the first thickness. - View Dependent Claims (23, 24, 25, 26)
Specification