MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
First Claim
1. A method of manufacturing a semiconductor device, comprising:
- forming a second core on a member to be processed, and a first core on the second core, the second core located below the first core and having a width larger than that of the first core;
forming a coating film on a top surface and side surfaces of the first core, and a top surface and side surfaces of the second core;
processing the coating film into sidewall masks by partially removing the coating film in a manner that portions of the coating film, which are located on the side surfaces of the first and second cores, are left remaining;
etching the first and second cores by using the sidewall masks as a mask so as to remove the first core and portions of the second core which are not covered with the sidewall masks from above, so that an etching mask including the sidewall masks and portions of the second core which remain directly below the sidewall masks is formed; and
etching the member by using the etching mask as a mask, so that the member is patterned.
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Accused Products
Abstract
In one aspect of the present invention, a method of manufacturing semiconductor device may include forming a second core on a member to be processed, and a first core on the second core, the second core located below the first core and having a width larger than that of the first core, forming a coating film on a top surface and side surfaces of the first core, and a top surface and side surfaces of the second core, processing the coating film into sidewall masks by partially removing the coating film in a manner that portions of the coating film, which are located on the side surfaces of the first and second cores, are left remaining, etching the first and second cores by using the sidewall masks as a mask so as to remove the first core and portions of the second core which are not covered with the sidewall masks from above, so that an etching mask including the sidewall masks and portions of the second core which remain directly below the sidewall masks is formed, and etching the member by using the etching mask as a mask, so that the member is patterned.
151 Citations
10 Claims
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1. A method of manufacturing a semiconductor device, comprising:
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forming a second core on a member to be processed, and a first core on the second core, the second core located below the first core and having a width larger than that of the first core; forming a coating film on a top surface and side surfaces of the first core, and a top surface and side surfaces of the second core; processing the coating film into sidewall masks by partially removing the coating film in a manner that portions of the coating film, which are located on the side surfaces of the first and second cores, are left remaining; etching the first and second cores by using the sidewall masks as a mask so as to remove the first core and portions of the second core which are not covered with the sidewall masks from above, so that an etching mask including the sidewall masks and portions of the second core which remain directly below the sidewall masks is formed; and etching the member by using the etching mask as a mask, so that the member is patterned. - View Dependent Claims (2, 3, 4, 5)
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6. A method for manufacturing a semiconductor device, comprising:
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forming a plurality of m cores (m is a positive integer) at an arrangement pitch P sequentially on a member to be processed, the m cores having successively increasing widths from the uppermost core; forming a coating film, so that side surfaces of the respective m cores are covered with the coating film; processing the coating film into sidewall masks by partially removing the coating film in a manner that portions of the coating film, which are located respectively on the side surfaces of the m cores, are left remaining; etching the m cores by using the sidewall masks as a mask so as to remove the first core at the top among the m cores and to remove portions, which are not covered with the sidewall masks from above, of the second to m-th cores from the top, thereby forming an etching mask including the sidewall masks and portions, which remain directly below the sidewall masks, of the second to the m-th cores; and etching the member by using the etching mask as a mask, so that the member is patterned, wherein the m cores are formed so that the width of the n-th core (n is an integer between 1 and m inclusive) from the top becomes approximately (4n−
3)P/(4m), andeach of the sidewall masks is formed to have a width of approximately P/(4m). - View Dependent Claims (7, 8, 9, 10)
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Specification