GALLIUM NITRIDE-BASED LIGHT EMITTING DEVICE WITH ROUGHENED SURFACE AND FABRICATING METHOD THEREOF
First Claim
1. A gallium nitride-based light emitting device with a roughened surface, comprising:
- a substrate;
a buffer layer formed on said substrate;
a III-nitride semiconductor layer of a first conductive type formed on said buffer layer;
a III-nitride semiconductor active layer formed on said III-nitride semiconductor layer of said first conductive typea first III-nitride semiconductor layer of a second conductive type formed on said III-nitride semiconductor active layer, wherein said first conductive type and said second conductive type are opposite;
a heavily doped III-nitride semiconductor layer of said second conductive type formed on said first III-nitride semiconductor layer of said second conductive type; and
a roughened second III-nitride semiconductor layer of said second conductive type formed on said heavily doped III-nitride semiconductor layer of said second conductive type.
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Accused Products
Abstract
A gallium nitride-based light emitting device with a roughened surface is described. The light emitting device comprises a substrate, a buffer layer grown on the substrate, an n-type III-nitride semiconductor layer grown on the buffer layer, a III-nitride semiconductor active layer grown on the n-type III-nitride semiconductor layer, a first p-type III-nitride semiconductor layer grown on the III-nitride semiconductor active layer, a heavily doped p-type III semiconductor layer grown on the first p-type III-nitride semiconductor, and a roughened second p-type III-nitride semiconductor layer grown on the heavily doped p-type III semiconductor layer.
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Citations
17 Claims
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1. A gallium nitride-based light emitting device with a roughened surface, comprising:
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a substrate; a buffer layer formed on said substrate; a III-nitride semiconductor layer of a first conductive type formed on said buffer layer; a III-nitride semiconductor active layer formed on said III-nitride semiconductor layer of said first conductive type a first III-nitride semiconductor layer of a second conductive type formed on said III-nitride semiconductor active layer, wherein said first conductive type and said second conductive type are opposite; a heavily doped III-nitride semiconductor layer of said second conductive type formed on said first III-nitride semiconductor layer of said second conductive type; and a roughened second III-nitride semiconductor layer of said second conductive type formed on said heavily doped III-nitride semiconductor layer of said second conductive type. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for fabricating a gallium nitride-based light emitting device with a roughened surface, comprising steps of:
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forming a buffer layer on a substrate; forming a III-nitride semiconductor layer of a first conductive type on said buffer layer; forming a III-nitride semiconductor active layer on said III-nitride semiconductor layer of said first conductive type; forming a first III-nitride semiconductor layer of a second conductive type formed on said III-nitride semiconductor active layer; forming a first III-nitride semiconductor layer of a second conductive type on said III-nitride semiconductor active layer; forming a heavily doped III-nitride semiconductor layer of said second conductive type on said first III nitride semiconductor layer of said second conductive type, wherein said first conductive type and said second conductive type are opposite; and forming a roughened second III-nitride semiconductor layer of said second conductive type on said heavily doped III-nitride semiconductor layer of said second conductive type. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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Specification