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Triangle two dimensional complementary patterning of pillars

  • US 20090321789A1
  • Filed: 06/30/2008
  • Published: 12/31/2009
  • Est. Priority Date: 06/30/2008
  • Status: Active Grant
First Claim
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1. A method of making a device, comprising:

  • forming at least one device layer over a substrate;

    forming a plurality of spaced apart first features over the device layer, wherein each three adjacent first features form an equilateral triangle;

    forming sidewall spacers on the first features;

    filling a space between the sidewall spacers with a plurality of filler features;

    selectively removing the sidewall spacers; and

    etching the at least one device layer using at least the plurality of filler features as a mask.

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