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Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns

  • US 20090322757A1
  • Filed: 08/07/2009
  • Published: 12/31/2009
  • Est. Priority Date: 09/07/2001
  • Status: Active Grant
First Claim
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1. A device for generating pattern data for unevenness that is randomly arranged, said device comprising:

  • a coordinate displacement device that generates a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

    a pattern generator that arranges said patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement device to generate pattern data.

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