TIN PHOSPHATE BARRIER FILM, METHOD, AND APPARATUS
First Claim
1. A method of inhibiting oxygen and moisture penetration of a device, comprising the steps of:
- heating a tin phosphate starting material substantially free of fluorine in an electrically resistive heating element comprising tungsten, the heating comprising delivering a first electrical power to the resistive heating element to react the tungsten of the heating element with the tin phosphate starting material, then delivering a second electrical power to the resistive heating element greater than the first electrical power to volatilize the reacted tin phosphate starting material;
depositing a tin phosphate low liquidus temperature inorganic material, resulting from volatilizing the reacted tin phosphate starting material, in a layer on at least a portion of the deviceheat treating the layer in a substantially oxygen and moisture free environment to form a hermetic seal; and
wherein the deposited layer comprises from greater than 0 to about 10 wt. % tungsten.
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Abstract
A method is disclosed for inhibiting oxygen and moisture penetration of a device comprising the steps of depositing a tin phosphate low liquidus temperature (LLT) inorganic material on at least a portion of the device to create a deposited tin phosphate LLT material, and heat treating the deposited LLT material in a substantially oxygen and moisture free environment to form a hermetic seal; wherein the step of depositing the LLT material comprises the use of a resistive heating element comprising tungsten. An organic electronic device is also disclosed comprising a substrate plate, at least one electronic or optoelectronic layer, and a tin phosphate LLT barrier layer, wherein the electronic or optoelectronic layer is hermetically sealed between the tin phosphate LLT barrier layer and the substrate plate. An apparatus is also disclosed having at least a portion thereof sealed with a tin phosphate LLT barrier layer.
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Citations
31 Claims
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1. A method of inhibiting oxygen and moisture penetration of a device, comprising the steps of:
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heating a tin phosphate starting material substantially free of fluorine in an electrically resistive heating element comprising tungsten, the heating comprising delivering a first electrical power to the resistive heating element to react the tungsten of the heating element with the tin phosphate starting material, then delivering a second electrical power to the resistive heating element greater than the first electrical power to volatilize the reacted tin phosphate starting material; depositing a tin phosphate low liquidus temperature inorganic material, resulting from volatilizing the reacted tin phosphate starting material, in a layer on at least a portion of the device heat treating the layer in a substantially oxygen and moisture free environment to form a hermetic seal; and wherein the deposited layer comprises from greater than 0 to about 10 wt. % tungsten. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 21)
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9-20. -20. (canceled)
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22. A method of inhibiting oxygen and moisture penetration of a device, comprising the steps of:
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heating a tin phosphate starting material in a tungsten boat to react the tungsten of the boat with the tin phosphate starting material; evaporating the reacted tin phosphate starting material and at least a portion of the tungsten; depositing the reacted tin phosphate starting material and the at least a portion of the tungsten on the device to form a layer of tin phosphate low liquidus temperature inorganic material on the device; heat treating the tin phosphate low liquidus temperature inorganic material layer in a substantially oxygen and moisture free environment to form a hermetic seal; and wherein the deposited layer comprises from greater than 0 to about 10 wt. % tungsten. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification