METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA
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Abstract
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.
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Citations
72 Claims
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1-38. -38. (canceled)
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39. A method for atomic layer deposition on a surface of a substrate, comprising:
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(a) conditioning the surface for atomic layer deposition by providing reactive surface sites; (b) contacting a precursor material to the surface for allowing the reactive surface sites to react with molecules of the precursor material to obtain a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate; and (c) exposing the surface covered with precursor molecules to an atmospheric pressure plasma generated in a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites. - View Dependent Claims (40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 72)
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60. An apparatus for atomic layer deposition on a surface of a substrate in a treatment space, the apparatus comprising:
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(a) a gas supply device for providing various gas mixtures to the treatment space, the gas supply device being arranged to provide (i) a gas mixture comprising a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate, and, subsequently, (ii) a gas mixture comprising a reactive agent capable of converting the attached precursor molecules to active precursor sites, and (b) a plasma generator for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent. - View Dependent Claims (61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71)
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Specification