METHOD FOR CELL PATTERNING

• US 20090325256A1
• Filed: 08/03/2007
• Published: 12/31/2009
• Est. Priority Date: 08/10/2006
• Status: Abandoned Application

• Current Assignee: Tohoku University National Universities Corporation
• Original Assignee: Tohoku University National Universities Corporation
• Inventors: Suzuki, Masato, Matsue, Tomokazu, Yasukawa, Tomoyuki, Hori, Yoshio, Inagaki, Akiko, Shiku, Hitoshi, Komabayashi, Mariko
• Application Number:
  US12/310,042
• Publication Number:
  US 20090325256A1
• Time in Patent Office: Days
• US Class Current: 435/173.1
• CPC Class Codes: C12M 33/00 Means for introduction, transport, positioning, extraction, harvesting, peeling or sampling of biological material in or from the apparatus chemical or physical laboratory apparatus in general B01L, devices for taking cell samples A61B10/0045, withdrawing or distributing predetermined quantities of fluid B01L99/00
• CPC Class Codes: C12N 2535/10 Patterned coating
• CPC Class Codes: C12N 5/0068 General culture methods using substrates for specific animal cell type C12N5/06

Abstract

Provided is a method for cell patterning, using an electrode substrate including a plurality of electrodes and a cell culture substrate disposed so as to face the electrode substrate, the method comprising the steps of:

• • introducing a cell suspension containing cells into a region between the electrode substrate and the cell culture substrate; applying a voltage to the electrodes to generate a non-uniform electric field in the region; and arranging the cells at a position with low electric field strength on the cell culture substrate by utilizing negative dielectrophoresis so as to obtain the cell culture substrate on which the cells are arranged in a predetermined pattern.

Claims

1. A method for cell patterning, using an electrode substrate including a plurality of electrodes and a cell culture substrate disposed so as to face the electrode substrate, the method comprising the steps of:

introducing a cell suspension containing cells into a region between the electrode substrate and the cell culture substrate;

applying a voltage to the electrodes to generate a non-uniform electric field in the region; and

arranging the cells at a position with low electric field strength on the cell culture substrate by utilizing negative dielectrophoresis so as to obtain the cell culture substrate on which the cells are arranged in a predetermined pattern.

2. The method for cell patterning according to claim 1, wherein

a plurality of cell suspensions are prepared as the cell suspension,

the plurality of cell suspensions are introduced one after another into the region, and

by selecting a position with low electric field strength depending on the cells in each dell suspension, a plurality of cells are arranged onto the cell culture substrate one after another so as to obtain the cell culture substrate on which the plurality of cells are arranged in a predetermined pattern.

3. The method for cell patterning according to claim 1, wherein

in a case where the plurality of electrodes generate a plurality of electric fields having electric-field-strength maximum values of 8×

10⁴ V/m or more on the cell culture substrate, the position with low electric field strength is a halfway region between maximum points of the electric fields being adjacent to each other and satisfying conditions that an electric-field-strength maximum value of each electric field is 8×

10⁴ V/m or more, and that a space between the electric-field-strength maximum points is 30 to 200 μ

m.

4. The method for cell patterning according to claim 1, wherein

in a case where the plurality of electrodes generate a plurality of electric fields having electric-field-strength maximum values of 8×

10⁴ V/m or more on the cell culture substrate, the position with low electric field strength is a halfway region between maximum points of the electric fields being adjacent to each other and satisfying conditions that a electric-field-strength maximum value of each electric field is in a range of 8×

10⁴ to 10×

10⁴ V/m, and a space between the electric-field-strength maximum points is 30 to 150 μ

m.

5. The method for cell patterning according to claim 1, wherein

a distance between the electrode substrate and the cell culture substrate is 30 to 50 μ

m.

6. The method for cell patterning according to claim 1, wherein

a content of the cell in the cell suspension is 5×

10⁷ cells/ml or less.

7. The method for cell patterning according to claim 1, wherein

a solvent for the cell suspension has a polarizability larger than a polarizability of the cells.