SUBSTRATE SUPPORTING UNIT AND SINGLE TYPE SUBSTRATE POLISHING APPARATUS USING THE SAME
First Claim
1. A substrate supporting unit comprising:
- a vacuum plate to which a substrate is attached by vacuum suction;
a supporting plate disposed under the vacuum plate at a predetermined distance from the vacuum plate, and at which chucking members are disposed to clamp the substrate; and
a driving member configured to move the vacuum plate or the supporting plate upward and downward so as to allow the chucking members to support the substrate in a state where the substrate is spaced upwardly from the supporting plate.
1 Assignment
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Accused Products
Abstract
Provided are a substrate supporting unit and a single type substrate polishing apparatus using the substrate supporting unit. During a polishing process, the bottom surface of a substrate is attached to the substrate supporting unit by vacuum suction, and during a post-cleaning process, the substrate is supported by the substrate supporting unit at a position spaced apart from the substrate supporting unit for cleaning the bottom surface of the substrate. Therefore, according to the substrate supporting unit and the substrate polishing apparatus using the substrate supporting unit, in a state where the substrate is supported by the single type substrate supporting unit, a process for polishing the top surface of the substrate and a post-process for cleaning the top and bottom surfaces of the substrate can be sequentially performed.
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Citations
29 Claims
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1. A substrate supporting unit comprising:
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a vacuum plate to which a substrate is attached by vacuum suction; a supporting plate disposed under the vacuum plate at a predetermined distance from the vacuum plate, and at which chucking members are disposed to clamp the substrate; and a driving member configured to move the vacuum plate or the supporting plate upward and downward so as to allow the chucking members to support the substrate in a state where the substrate is spaced upwardly from the supporting plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A single type substrate polishing apparatus comprising:
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a process chamber; a substrate supporting unit disposed in the process chamber for supporting a substrate; a polishing unit configured to polish the substrate; and a cleaning unit configured to clean the polished substrate, wherein the substrate supporting unit comprises; a vacuum plate to which the substrate is attached by vacuum suction; a supporting plate disposed under the vacuum plate at a predetermined distance from the vacuum plate, and at which chucking members are disposed to clamp the substrate; and a driving member configured to move the vacuum plate or the supporting plate upward and downward so as to allow the chucking members to support the substrate in a state where the substrate is spaced upwardly from the supporting plate. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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Specification