METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM

• US 20100000966A1
• Filed: 09/16/2009
• Published: 01/07/2010
• Est. Priority Date: 01/31/2008
• Status: Abandoned Application

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: SAKURAI, Masatoshi, KIMURA, Kaori, KAMATA, Yoshiyuki, SHIROTORI, Satoshi, ISOWAKI, Yosuke
• Application Number:
  US12/561,168
• Publication Number:
  US 20100000966A1
• Time in Patent Office: Days
• US Class Current: 216/22
• CPC Class Codes: G11B 5/855 Coating only part of a support with a magnetic layer
• CPC Class Codes: H01F 10/12 being metals or alloys intermetallic compounds H01F10/18
• CPC Class Codes: H01F 10/265 Magnetic multilayers non exchange-coupled H01F10/32 takes precedence
• CPC Class Codes: H01F 41/34 in patterns, e.g. by lithography

Abstract

According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer on a substrate, forming masks on areas corresponding to recording regions of the magnetic recording layer, partially etching the magnetic recording layer in areas not covered with the masks with an etching gas to form protrusions and recesses on the magnetic recording layer, modifying the magnetic recording layer remaining in the recesses with Ne gas to form non-recording regions, and forming a protecting film on an entire surface.

Claims

1. A method of manufacturing a magnetic recording medium, comprising:

depositing a magnetic recording layer on a substrate;

forming masks on areas corresponding to recording regions of the magnetic recording layer;

partially etching the magnetic recording layer in areas not under the masks with an etching gas to form protrusions and recesses on the magnetic recording layer;

modifying the magnetic recording layer in the recesses with neon (Ne) gas to form non-recording regions; and

forming a protecting film on an entire surface.

2. The method of claim 1, wherein argon (Ar) is used as the etching gas.

3. A method of manufacturing a magnetic recording medium, comprising:

depositing a magnetic recording layer on a substrate;

forming masks on areas corresponding to recording regions of the magnetic recording layer;

partially etching and modifying the magnetic recording layer simultaneously in areas not under the masks with a mixture gas of an etching gas and Ne gas to form protrusions and recesses on the magnetic recording layer and non-recording regions in the recesses; and

forming a protecting film on an entire surface.

4. The method of claim 3, wherein Ar is used as the etching gas.

5. A method of manufacturing a magnetic recording medium, comprising:

depositing a magnetic recording layer on a substrate;

forming masks on areas corresponding to recording regions of the magnetic recording layer;

modifying the magnetic recording layer in areas not under the masks with Ne gas to form non-recording regions; and

forming a protective film on an entire surface.