LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME
First Claim
1. A light emitting device comprising:
- a first conductive type lower semiconductor layer;
a current diffusion layer on the first conductive type lower semiconductor layer, wherein the current diffusion layer comprises an uneven surface;
a first conductive type upper semiconductor layer on the current diffusion layer, wherein the first conductive type upper semiconductor layer comprises an uneven surface;
an active later on the first conductive type upper semiconductor layer; and
a second conductive type semiconductor layer on the active layer.
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Accused Products
Abstract
A light emitting device and a method of manufacturing the same are provided. The light emitting device comprises a first conductive type lower semiconductor layer, a current diffusion layer, a first conductive type upper semiconductor layer, an active layer, and a second conductive type semiconductor layer. The current diffusion layer is formed on the first conductive type lower semiconductor layer. The first conductive type upper semiconductor layer is formed on the current diffusion layer. The active layer is formed on the first conductive type upper semiconductor layer. The second conductive type semiconductor layer is formed on the active layer.
16 Citations
25 Claims
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1. A light emitting device comprising:
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a first conductive type lower semiconductor layer; a current diffusion layer on the first conductive type lower semiconductor layer, wherein the current diffusion layer comprises an uneven surface; a first conductive type upper semiconductor layer on the current diffusion layer, wherein the first conductive type upper semiconductor layer comprises an uneven surface; an active later on the first conductive type upper semiconductor layer; and a second conductive type semiconductor layer on the active layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 15)
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11. A light emitting device comprising:
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a first conductive type lower semiconductor layer; a current diffusion layer directly on the first conductive type lower semiconductor layer; a first conductive type upper semiconductor layer on the current diffusion layer; an active later on the first conductive type upper semiconductor layer; and a second conductive type semiconductor layer on the active layer. - View Dependent Claims (12, 13, 14)
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16. A light emitting device comprising:
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a substrate; a first layer on the substrate, wherein the first layer has a conductivity; an ITO layer on the first layer; a second layer on the ITO layer wherein the second layer comprises a first conductivity type semiconductor layer; an active layer on the second layer; and a third layer on the active layer, wherein the third layer comprises a second conductivity type semiconductor layer, wherein the ITO layer has an uneven surface. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of manufacturing a light emitting device, the method comprising:
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forming a buffer layer on a substrate; forming an undoped nitride layer; forming a first conductive type lower semiconductor layer on the undoped nitride layer; forming a current diffusion layer on the first conductive type lower semiconductor layer; forming a first conductive type upper semiconductor layer on the current diffusion layer; forming an active layer on the first conductive type upper semiconductor layer; and forming a second conductive type semiconductor layer on the active layer.
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Specification