SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOF
First Claim
1. A semiconductor device comprising:
- a substrate, the substrate comprising a body, the body having a surface, the substrate being provided with an insulating layer on the surface of the body;
a conductor with insulating sidewall spacers located in the insulating layer, the conductor having a current-flow direction during operation, the conductor having a first width, the insulating sidewall spacers each having a second width being smaller than the first width of the conductor, the first width and the second width being measured in a direction perpendicular to the current-flow direction of the conductor and parallel to said surface, the conductor having a first top surface extending parallel to said surface, the insulating sidewall spacers having a second top surface, andairgaps located in the insulating layer adjacent to the insulating sidewall spacers,characterized in that the first top surface coincides with the second top surface, and in that the airgaps extend from the surface of the body to said first and second top surface.
10 Assignments
0 Petitions
Accused Products
Abstract
The invention relates to a semiconductor device comprising: a substrate (1), the substrate (1) comprising a body (5), the body (5) having a surface, the substrate (1) being provided with an insulating layer (10) on the surface of the body (1);—a conductor (25) with insulating sidewall spacers (22) located in the insulating layer (10), the conductor (25) having a current-flow direction during operation, the conductor (25) having a first width, the insulating sidewall spacers (22) each having a second width being smaller than the first width of the conductor (25), the first width and the second width being measured in a direction perpendicular to the current-flow direction of the conductor (25) and parallel to said surface, the conductor (25) having a first top surface extending parallel to said surface, the insulating sidewall spacers (22) having a second top surface, and airgaps (30) located in the insulating layer (10) adjacent to the insulating sidewall spacers (22), characterized in that the first top surface coincides with the second top surface, and in that the airgaps (30) extend from the surface of the body (5) to said first and second top surface. The invention further relates to a method of manufacturing such a semiconductor device. The semiconductor device according to the invention enables a lower resistance of the conductor while still providing a tolerance for unlanded vias.
432 Citations
15 Claims
-
1. A semiconductor device comprising:
-
a substrate, the substrate comprising a body, the body having a surface, the substrate being provided with an insulating layer on the surface of the body; a conductor with insulating sidewall spacers located in the insulating layer, the conductor having a current-flow direction during operation, the conductor having a first width, the insulating sidewall spacers each having a second width being smaller than the first width of the conductor, the first width and the second width being measured in a direction perpendicular to the current-flow direction of the conductor and parallel to said surface, the conductor having a first top surface extending parallel to said surface, the insulating sidewall spacers having a second top surface, and airgaps located in the insulating layer adjacent to the insulating sidewall spacers, characterized in that the first top surface coincides with the second top surface, and in that the airgaps extend from the surface of the body to said first and second top surface. - View Dependent Claims (2, 3)
-
-
4. A method of manufacturing a semiconductor device comprising steps of:
-
providing a substrate, the substrate comprising a body, the body having a surface, the substrate being provided with an insulating layer on the surface of the body; forming a conductor with insulating sidewall spacers in the insulating layer, the conductor having a current-flow direction during operation, the conductor having a first width, the insulating sidewall spacers each having a second width being smaller than the first width of the conductor, the first width and the second width being measured in a direction perpendicular to the current-flow direction of the conductor and parallel to said surface, the conductor having a first top surface extending parallel to said surface, the insulating sidewall spacers having a second top surface, the first top surface coinciding with the second top surface, and forming airgaps in the insulating layer adjacent to the insulating sidewall spacers, the airgaps extending from the surface of the body to said first and second top surface. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
-
Specification