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EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

  • US 20100002206A1
  • Filed: 03/30/2006
  • Published: 01/07/2010
  • Est. Priority Date: 03/30/2005
  • Status: Active Grant
First Claim
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1. A method for determining an exposure condition when exposing a substrate by irradiating the substrate with exposure light via a liquid of liquid immersion region formed on the substrate, the method comprising:

  • detecting the situation of a liquid immersion region formed on the surface of a predetermined object while changing at least one of the movement condition of the object and the liquid immersion condition when forming the liquid immersion region; and

    determining the exposure condition based on the detection results.

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