Systems and Methods for Minimizing Scattered Light in Multi-SLM Maskless Lithography
First Claim
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1. A method, comprising:
- projecting a patterned beam of radiation towards a substrate; and
blocking scattered light before the beam of radiation interacts with the substrate.
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Abstract
A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
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Citations
21 Claims
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1. A method, comprising:
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projecting a patterned beam of radiation towards a substrate; and blocking scattered light before the beam of radiation interacts with the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method, comprising:
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generating beams using respective patterning devices, each of the respective patterning devices comprising a reflecting portion, the reflecting portion including an array of programmable elements that each are configured to produce a beam, and a non-reflecting portion, wherein respective beams form a patterned beam and wherein the non-reflecting portion is configured to produce stray beams; directing the patterned beams onto a surface; and blocking the stray beams from reaching the surface using an aperture device comprising a number of openings, the number corresponding to a number of the patterning devices, the openings arranged in a configuration to correspond to locations of the patterning devices, the openings being arranged in a configuration to transmit the patterned beam, while substantially blocking the stray beams; wherein a spacing between adjacent ones of the elements in each of the array of programmable elements is smaller than a spacing between adjacent ones of the patterning devices. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21)
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Specification