EPITAXIAL SEMICONDUCTOR DEPOSITION METHODS AND STRUCTURES
First Claim
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1. A method for forming a protective cap layer, the method comprising:
- providing a strained epitaxial film; and
providing a flow of a silicon precursor to the strained film to deposit a protective cap layer on the strained epitaxial film at a deposition temperature between about 325°
C. and about 475°
C.
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Abstract
Methods for depositing epitaxial films such as epitaxial Ge and SiGe films. During cooling from high temperature processing to lower deposition temperatures for Ge-containing layers, Si or Ge compounds are provided to the substrate. Smooth, thin, relatively defect-free Ge or SiGe layers result. Retrograded relaxed SiGe is also provided between a relaxed, high Ge-content seed layer and an overlying strained layer.
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Citations
15 Claims
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1. A method for forming a protective cap layer, the method comprising:
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providing a strained epitaxial film; and providing a flow of a silicon precursor to the strained film to deposit a protective cap layer on the strained epitaxial film at a deposition temperature between about 325°
C. and about 475°
C. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of preventing agglomeration of a strained layer deposited on a relaxed buffer layer, the method comprising:
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providing a structure having the strained layer deposited on the relaxed buffer layer; providing a flow of a silicon precursor to the strained layer to deposit an epitaxial layer at a temperature between about 325°
C. and about 475°
C. to serve as a cap layer that prevents agglomeration of the strained layer. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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Specification