GAS DISTRIBUTION PLATE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

• US 20100006031A1
• Filed: 07/05/2009
• Published: 01/14/2010
• Est. Priority Date: 07/08/2008
• Status: Active Grant

• Current Assignee: Jusung Engineering Company Limited
• Original Assignee: Jusung Engineering Company Limited
• Inventors: CHOI, Jae-Wook, Park, Chan-Ho
• Granted Patent: US 8,702,867 B2
• Time in Patent Office: Days
• US Class Current: 118/723.R
• CPC Class Codes: C23C 16/45565 Shower nozzles

Abstract

A gas distribution plate that is installed in a chamber providing a reaction space and supplies a reaction gas onto a substrate placed on a substrate placing plate, wherein the gas distribution plate includes: first and second surfaces opposing to each other, wherein the second surface faces the substrate placing plate and has a recess shape; and a plurality of injection holes each including: an inflow portion that extends from the first surface toward the second surface; a diffusing portion that extends from the second surface toward the first surface; and an orifice portion between the inflow portion and the diffusing portion, wherein the plurality of inflow portions of the plurality of injection holes decrease in gas path from edge to middle of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same gas path.

Claims

1. A gas distribution plate that is installed in a chamber providing a reaction space and supplies a reaction gas onto a substrate placed on a substrate placing plate, the gas distribution plate comprising:

first and second surfaces opposing to each other, wherein the second surface faces the substrate placing plate and has a recess shape; and

a plurality of injection holes each including;

an inflow portion that extends from the first surface toward the second surface;

a diffusing portion that extends from the second surface toward the first surface; and

an orifice portion between the inflow portion and the diffusing portion,

wherein the plurality of inflow portions of the plurality of injection holes decrease in gas path from edge to middle of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same gas path.

2. The gas distribution plate according to claim 1, wherein a distance between the second surface and the substrate placing plate decreases from middle to edge of the gas distribution plate.

3. The gas distribution plate according to claim 1, wherein the first surface is planar and parallel with the substrate placing plate.

4. The gas distribution plate according to claim 1, wherein the plurality of inflow portions are arranged at substantially the same interval therebetween with respect to a plane of the gas distributing plate, and the plurality of inflow portions are arranged at intervals therebetween, which increase from middle to edge of the gas distribution plate, with respect to the second surface.

5. The gas distribution plate according to claim 1, wherein the plurality of orifice portions of the plurality of injection holes have substantially the same gas path and are arranged in parallel with the second surface.

6. The gas distribution plate according to claim 1, wherein the plurality of diffusing portions have substantially the same diameter and volume, and are arranged at substantially the same interval therebetween and in parallel with the second surface.

7. The gas distribution plate according to claim 1, wherein a center axis of the diffusing portion is perpendicular to the substrate placing plate.

8. The gas distribution plate according to claim 1, wherein the diffusing portion has a cone shape truncated at top thereof.

9. The gas distribution plate according to claim 1, wherein the recess shape of the second surface has an elliptical arc shape in cross-section.

10. The gas distribution plate according to claim 1, wherein the second surface includes a plurality of step portions.

11. The gas distribution plate according to claim 10, wherein the plurality of step portions are configured concentrically around middle of the gas distribution plate.

12. The gas distribution plate according to claim 10, wherein the plurality of step portions are more recessed from edge to middle of the gas distribution plate.

13. The gas distribution plate according to claim 10, wherein the plurality of inflow portions are divided into a plurality of groups corresponding to the plurality of step portions, respectively, and the plurality of groups have different gas paths therebetween.

14. The gas distribution plate according to claim 10, wherein the plurality of inflow portions are divided into a plurality of groups corresponding to the plurality of step portions, respectively, and the inflow portions of each of the plurality of groups have substantially the same gas path.

15. A substrate treating apparatus, comprising:

a chamber providing a reaction space;

a substrate placing plate in the reaction space, wherein a substrate is placed on the substrate placing plate; and

a gas distribution plate in the reaction space, the gas distribution plate including;

first and second surfaces opposing to each other, wherein the second surface faces the substrate placing plate and has a recess shape; and

a plurality of injection holes each including;

an inflow portion that extends from the first surface toward the second surface;

a diffusing portion that extends from the second surface toward the first surface; and

an orifice portion between the inflow portion and the diffusing portion,

wherein the plurality of inflow portions of the plurality of injection holes decrease in gas path from edge to middle of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same gas path.

16. The apparatus according to claim 15, wherein the recess shape of the second surface has an elliptical arc shape or a plurally stepped shape.