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PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM

  • US 20100006543A1
  • Filed: 12/27/2007
  • Published: 01/14/2010
  • Est. Priority Date: 01/15/2007
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus having a processing chamber and a mounting table provided within the processing chamber for processing a substrate mounted on the mounting table by plasma due to a processing gas, the apparatus comprising:

  • first and second electrodes provided in an upper portion of the processing chamber so as to face the mounting table;

    a gas supply unit for supplying the processing gas into between the first and second electrodes;

    a radio frequency (RF) power supply unit connected to at least one of the first and second electrodes for applying a RF power between the first and second electrodes so that the processing gas supplied into between the first and second electrodes is converted to the plasma; and

    a gas exhaust unit coupled to a lower portion of the processing chamber for exhausting the inside of the processing chamber to a vacuum level.

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