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COLOR FILTER ARRAY ALIGNMENT MARK FORMATION IN BACKSIDE ILLUMINATED IMAGE SENSORS

  • US 20100006909A1
  • Filed: 07/09/2008
  • Published: 01/14/2010
  • Est. Priority Date: 07/09/2008
  • Status: Active Grant
First Claim
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1. A method of forming color filter array alignment marks in an image sensor wafer, the image sensor wafer being utilized to form a plurality of image sensors each having a pixel array configured for backside illumination, the image sensor wafer comprising at least a substrate and a sensor layer, the method comprising the steps of:

  • forming color filter array alignment mark openings in the sensor layer; and

    forming an epitaxial layer on a frontside surface of the sensor layer;

    wherein the epitaxial layer comprises polysilicon color filter array alignment marks formed in locations corresponding to respective ones of the color filter array alignment mark openings in the sensor layer.

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