Coupling apparatus, exposure apparatus, and device fabricating method

• US 20100007865A1
• Filed: 09/16/2009
• Published: 01/14/2010
• Est. Priority Date: 07/09/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Ono, Kazuya, Shibazaki, Yuichi
• Granted Patent: US 8,120,751 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Abstract

An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group. The first group is supported by a first support member via a vibration isolating apparatus.

Claims

1. An exposure apparatus that fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate, wherein

the projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group,

the first group is supported by a first support member via a vibration isolating apparatus.