Multifunctional vacuum manifold
First Claim
49. A manifold assembly comprising:
- a collar having a substantially vertical side wall including a bottom periphery region forming a skirt;
a base having a peripheral portion;
a first seal positioned between the collar and the base wherein the skirt sealingly positions over the peripheral portion of the base;
a first sample-processing device having an outer perimeter edge wherein the collar is positioned on the outer perimeter edge of the first sample processing device, and an upper surface having a porous membrane attached thereto;
a second seal comprising a gasket positioned between the first sample processing device and the collar; and
a second sample processing device stacked below the first sample processing device to form an integral stacked unit preventing relative movement between the first and second devices, the stacked unit positioned between the collar and the base.
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Accused Products
Abstract
A laboratory device design particularly for a multiplate format that includes a manifold wherein the position of the plate is not a function of gasket compression or vacuum rate applied. In one embodiment, the device has a modular design, wherein one or more removable inserts, preferably with different functionalities can be positioned between a base component and a collar component. The particular insert(s) chosen depend on the desired sample preparation or assay to be carried out. The insert(s) are stacked and are positioned between the base and collar as a unit, so that the stack within the manifold does not move during evacuation of the vacuum chamber. The consistent position of the insert(s) facilitates using vacuum sample processing with automated liquid handlers.
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Citations
94 Claims
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49. A manifold assembly comprising:
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a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion; a first seal positioned between the collar and the base wherein the skirt sealingly positions over the peripheral portion of the base; a first sample-processing device having an outer perimeter edge wherein the collar is positioned on the outer perimeter edge of the first sample processing device, and an upper surface having a porous membrane attached thereto; a second seal comprising a gasket positioned between the first sample processing device and the collar; and a second sample processing device stacked below the first sample processing device to form an integral stacked unit preventing relative movement between the first and second devices, the stacked unit positioned between the collar and the base. - View Dependent Claims (50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61)
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62. A manifold assembly comprising:
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a collar having a substantially lateral side wall; a base in sealing engagement with the collar, the base comprising an outer peripheral flange and a side wall which together form a peripheral groove; a first gasket positioned between the base and the collar wherein a portion of first gasket contacts a slot formed in the collar; wherein the collar comprises a skirt formed along a bottom periphery of the substantially lateral wall such that the skirt sealingly positions over a peripheral portion of the base; a first sample processing device having an upper surface, and having a porous membrane attached to the upper surface; and a second gasket positioned between the sample processing device and the collar, such that the sample processing is in sealing engagement with the collar. - View Dependent Claims (63, 64, 65, 66, 67, 68)
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69. A manifold assembly comprising:
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a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion wherein the skirt sealingly positions over the peripheral portion of the base; a first sample processing device having an outer perimeter edge, and an upper surface having a porous membrane attached thereto; a second processing device stacked below the first sample processing device to form an integral stacked unit preventing relative movement between the first and second devices, the stacked unit positioned between the collar and the base, and the collar is positioned on the outer perimeter edge of the first sample processing device; and a first seal between the collar and the base; and
a second seal between the first sample processing device and the collar, wherein the first and second seals are a unitary seal. - View Dependent Claims (70, 71)
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72. A manifold assembly comprising:
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a base; a collar comprising a skirt formed along a bottom periphery of a lateral wall such that the skirt positions over a peripheral portion of the base; a first sample processing device comprising a multiwell filtration plate or a single well filtration device, and an upper surface having a porous membrane attached thereto; a second processing device stacked below the first sample processing device to form an integral stacked unit preventing relative movement between the first and second devices, the stacked unit positioned between the collar and the base; a first seal between the collar and the base; and a second seal between the first sample processing device and the collar, wherein the first and second seals are a unitary seal; wherein the first sample processing device is seated recessed within the collar such that the top surface of the first sample processing device lies below the top surface of the collar. - View Dependent Claims (73)
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74. A manifold assembly comprising:
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a base comprising a flat surface and having a peripheral portion; a collar comprising a substantially vertical side wall including a bottom periphery region forming a skirt and a port for communication with a vacuum source; a first sealing gasket positioned between the base and the collar wherein the skirt sealingly positions over the peripheral portion of the base; and a first sample processing device having an outer perimeter edge wherein the collar is sealingly positioned on the outer perimeter edge of the first sample processing device, and an upper surface having a porous membrane attached thereto, and a second seal comprising a gasket positioned between the first sample processing device and the collar. - View Dependent Claims (75, 76, 77, 78, 79, 80, 81, 82)
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83. A method of applying vacuum to a manifold assembly, comprising:
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a) providing a vacuum source; b) providing a manifold comprising a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion; a first seal positioned between the collar and the base wherein the skirt sealingly positions over the peripheral portion of the base; a first sample-processing device having an outer perimeter edge wherein the collar is positioned on the outer perimeter edge of the first sample processing device, and an upper surface having a porous membrane attached thereto; a second seal comprising a gasket positioned between the first sample processing device and the collar; a second sample processing device stacked below the first sample processing device to form an integral stacked sample processing unit preventing relative movement between the first and second devices, the stacked unit positioned between the collar and the base, and a port for communication with a vacuum source, the port being formed in a manifold component selected from the group consisting of the base and the collar; c) positioning the integral stacked sample processing unit between the base and the collar; d) positioning the collar on the base; and e) applying a vacuum to the manifold with the vacuum source, whereby the collar is forced into sealing engagement with the integral stacked sample processing unit without causing movement of the sample processing unit. - View Dependent Claims (84, 85, 86, 87, 88, 89)
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90. A method of applying vacuum to a manifold assembly, comprising:
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a) providing a vacuum source; b) providing a manifold comprising a base having a peripheral portion and a port for communication with the vacuum source, a collar having a substantially vertical side wall including a bottom periphery region forming a skirt, a first seal positioned between the collar and the base wherein the skirt sealingly positions over the peripheral portion of the base, a first sample-processing device having an outer perimeter edge wherein the collar is positioned on the outer perimeter edge of the first sample processing device, and an upper surface having a porous membrane attached thereto, second seal comprising a gasket positioned between the first sample processing device and the collar; and c) positioning the first sample processing device between the base and the collar; d) positioning the collar on the base; and e) applying a vacuum to the manifold with the vacuum source, whereby the collar is forced into sealing engagement with the base and the first sampling processing device without causing movement of the first sample processing device. - View Dependent Claims (91, 92, 93, 94)
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Specification