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METHOD OF FABRICATING MICRO-VERTICAL STRUCTURE

  • US 20100009514A1
  • Filed: 04/02/2009
  • Published: 01/14/2010
  • Est. Priority Date: 07/08/2008
  • Status: Active Grant
First Claim
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1. A method of fabricating a micro-vertical structure, comprising:

  • forming an insulating layer on a first crystalline silicon substrate and patterning the insulating layer to form an insulating layer pattern and a first cavity for preventing occurrence of footings;

    bonding a second crystalline silicon substrate onto the insulating layer pattern and etching the second crystalline silicon substrate using a deep reactive ion etch (DRIE) process, wherein the second crystalline silicon substrate is etched along a crystal plane vertical to the second crystalline silicon substrate; and

    etching an etched vertical surface of the second crystalline silicon substrate using a crystalline wet etching process to form the micro-vertical structure having a vertical surface vertical to the second crystalline silicon substrate.

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