SOLAR CELL OF QUANTUM WELL STORE AND METHOD OF PREPARATION THEREOF

• US 20100018575A1
• Filed: 08/14/2006
• Published: 01/28/2010
• Est. Priority Date: 08/14/2006
• Status: Abandoned Application

• Current Assignee: Zhongmou Chen
• Original Assignee: Zhongmou Chen
• Inventors: Chen, Zhongmou
• Application Number:
  US12/312,447
• Publication Number:
  US 20100018575A1
• Time in Patent Office: Days
• US Class Current: 136/255
• CPC Class Codes: H01L 31/0352 characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
• CPC Class Codes: H01L 31/06 characterised by potential barriers
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

A solar cell of quantum well store is disclosed, including a semiconductor substrate (1), a diffusion layer (2) and upper and lower electrodes (7,6), a light doped epitaxial layer (10) whose conductive type is the same as the semiconductor substrate is disposed on the semiconductor substrate (1), there are ribs on the epitaxial layer (10), the ribs are the structure of strip shape and comprise multiple perpendicular ribs (11) which are parallel and at least a longitudinal rib (13), the longitudinal rib (13) is connected with and runned through perpendicular ribs (11), a interspace surrounded by longitudinal rib (13) and perpendicular ribs (11) is a space of ribs (12); disposed on the ribs of strip shape: a nanometer ion-implanted layer (3) which has opposite conductive type to that of epitaxial layer and a high doped layer (4) which has opposite conductive type to that of ion-implanted layer, the ion-implanted layer is covered with the high doped layer, and the high doped layer is covered with a metal layer (9); the lead of upper electrode (7) is connected to the metal layer on the longitudinal rib; the diffusion layer (2) is disposed in the space of ribs and its conductive type is opposite with that of epitaxial layer, a oxide layer (5) is disposed on the diffusion layer; and, the voltage of back field is applied between the upper and lower electrodes.

Claims

1. A solar cell of quantum well store, comprising a semiconductor substrate, a diffusion layer and upper and lower electrodes, wherein a light doped epitaxial layer whose conductive type is the same as the semiconductor substrate is disposed on said semiconductor substrate, there are ribs on the epitaxial layer, the ribs are the structure of strip shape and comprise multiple longitudinal ribs which are parallel and at least one transverse rib, the transverse rib is connected with and run through parallel longitudinal ribs;

an interspace surrounded by longitudinal ribs and transverse rib is a between the ribs;

disposed on the ribs of strip shape;

a nanometer ion-implanted layer which has opposite conductive type to that of epitaxial layer and a high doped layer which has opposite conductive type to that of ion-implanted layer, the nanometer ion-implanted layer is covered with the high doped layer, and the high doped layer is covered with a metal layer;

the lead of upper electrode is connected to the metal layer on transverse rib;

the diffusion layer is disposed in the whole between the ribs and its conductive type is opposite with that of epitaxial layer, an oxide layer is disposed on the diffusion layer; and

, the voltage of back field is applied between the upper and lower electrodes.

2. The solar cell of quantum well store of claim 1, wherein said back field voltage is reverse bias voltage, the internal resistance of this reverse bias voltage DC power supply is less than or equal to 1/N of load battery internal resistance, and value of N is larger than 6.

3. The solar cell of quantum well store of claim 1, wherein said back field voltage is higher than load battery voltage.

9. The solar cell of quantum well store of claim 1, wherein said epitaxial layer has thickness of 15-20 nanometers and resistivity of 7.5-8.5 Ω

·

cm;

said ion-implanted layer has thickness of 1-100 nanometers and doping concentration of 10¹⁴˜

10¹⁹ cm<sup>−

3</sup>; and

said high doped layer has sub-micron level thickness and doping concentration of 10¹⁷˜

10²¹ cm<sup>−

3</sup>.

12. The solar cell of quantum well store of claim 1, wherein said semiconductor substrate is n⁺⁺ type silicon, said epitaxial layer is n⁻

type silicon, said diffusion layer is p⁺ type silicon, and said high doped layer is n⁺⁺ type extra-high doped poly-silicon.

13. The solar cell of quantum well store of claim 1, wherein said semiconductor substrate is P⁺⁺ type silicon, said epitaxial layer is p type silicon, said diffusion layer is n⁺ type silicon, and said high doped layer is P⁺⁺ type extra-high doped poly-silicon.

14. The solar cell of quantum well store of claim 1, wherein on load circuit, a charging branch circuit is connected via a DC booster and to the back field power supply.

15. The solar cell of quantum well store of claim 1, wherein isolation groove is provided around said substrate by means of diffusion.

16. The solar cell of quantum well store of claim 1, wherein buffering intrinsic layer is provided between ion-implanted layer and high doped layer, and between ion-implanted layer and semiconductor base layer.

17. Preparation method for the solar cell of quantum well store of claim 1, comprising the following steps:

(1) Substrate preparation;

adopt n type or P type semiconductor material;

(2) Growth of epitaxial layer;

growth of n⁻

type or P⁻

type epitaxial layer;

(3) Formation of diffusion zone;

After oxidation on epitaxial layer and first photo-etching of predetermined between the ribs, p⁺ type or n⁺ type diffusion zone is formed by diffusion;

(4) Formation of ion-implanted layer;

Grow a layer of silicon dioxide and then carry out second photo-etching;

etch windows at positions of ribs reserved among said diffusion zones (to completely remove oxide layer in window zones);

inject or diffuse compound of group 3 or group 5 element, and then carry out annealing so that impurity is pushed to required depth, to form p⁺ type or n⁺ type ion-implanted layer;

(5) Formation of high doped layer;

On ion-implanted layer, grow another layer of silicon dioxide and then carry out third photo-etching to obtain windows for growth of poly-silicon;

carry out fourth photo-etching to remove oxide layer on poly-silicon and obtain diffusion windows. By injection or diffusion of compound of group 3 or group 5 element, use method of ion implantation or LPCVD to form extra-high doped layer;

(6) Metal contact and interconnection;

Carry out fifth photo-etching and aluminum evaporation on surface of high doped layer to form aluminum layer and interconnecting metal electrodes;

(7) Rear encapsulation process;

(8) Connect back field voltage power supply between electrodes.

19. Preparation method for said solar cell of quantum well store of claim 17, wherein in said process steps, thickness of epitaxial layer prepared is 10˜

20 microns.

20. Preparation method for said solar cell of quantum well store of claim 17, wherein prepared ion-implanted layer has a thickness of 1˜

100 nanometers and a concentration of 10¹⁴˜

10¹⁹ cm³.

21. Preparation method for said solar cell of quantum well store of claim 17, wherein high doped layer prepare has a doping concentration of 10¹⁷˜

10²¹ cm<sup>−

3</sup> and thickness of 0.7 μ

m˜

0.9 μ

m.

22. Preparation method for said solar cell of quantum well store of claim 17, wherein,

in said process steps, conditions for photo-etching process are:

temperature controlled at 30-50°

C. and duration is 3-5 min;

in said diffusion steps, process conditions are;

temperature controlled at 1000-1200°

C., and duration is 16-20 min;

in said ion-implanted formation steps, process conditions are;

compound of group 3 or group 5 element is implanted under 50 KV, temperature controlled at 1000°

C., and duration is about 3 hours;

in said high doped layer formation steps, conditions for adoption of in-situ doping process are;

temperature controlled at 550-650°

C., vacuum controlled at 10<sup>−

5</sup>, and duration is 3 hours;

in said metal contact and interconnection steps, conditions for surface evaporated Al layer process on high doped implanted zone are;

temperature at 1148°

C., substrate temperature at 250°

C., temperatures are maintained for 8-12 min to form surface evaporated Al layer on high doped layer;

in step of connection of back field voltage power supply, back field voltage applied between the electrodes is 1˜

3V, and its internal resistance is less than or equal to ⅙

of internal resistance of external load battery.

23. Preparation method for said solar cell of quantum well store of claim 22, wherein in said diffusion layer formation step, temperature is controlled at 1100°

C. for 18 min, and by means of boron diffusion on diffusion zone of n⁻

type silicon semiconductor epitaxial material, p⁺ type diffusion layer is formed.

24. Preparation method for said solar cell of quantum well store of claim 22, wherein in said diffusion layer formation step, temperature is controlled at 1100°

C. for 18 min, and type n⁺ diffusion layer is formed by phosphorus diffusion on diffusion zone of p⁻

type silicon semiconductor epitaxial material.

25. Preparation method for said solar cell of quantum well store of claim 22, wherein in said ion-implanted layer formation step, said compound of group 3 or group 5 element is BF₃.

26. Preparation method for said solar cell of quantum well store of claim 22, wherein in said ion-implanted layer formation step, said compound of group 3 or group 5 element is PF₃.

27. Preparation method for said solar cell of quantum well store of claim 22, wherein in said high doped layer formation step, said extra-high doped poly-silicon is extra-high As doped poly-silicon.

28. Preparation method for said solar cell of quantum well store of claim 22, wherein in said high doped layer formation step, said extra-high doped poly-silicon is extra-high B doped poly-silicon.

4. (canceled)

5. (canceled)

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7. (canceled)

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10. (canceled)

11. (canceled)

18. (canceled)