Light emitting device using gan led chip
First Claim
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1. A light emitting device wherein a GaN-based LED chip of the following (a) is flip-chip mounted:
- (a) a GaN-based LED chip comprising a light-transmissive substrate and a GaN-based semiconductor layer formed on the light-transmissive substrate, the GaN-based semiconductor layer having a laminate structure comprising an n-type layer, a light emitting layer and a p-type layer in this order from the light-transmissive substrate side,wherein a positive electrode is formed on the p-type layer, said electrode comprisinga light-transmissive electrode composed of an oxide semiconductor anda positive contact electrode electrically connected to the light-transmissive electrode, andthe area of the positive contact electrode is less than ½
of the area of the upper surface of the p-type layer.
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Abstract
A light emitting device is constituted by flip-chip mounting a GaN-based LED chip 100 of the following (a):
- (a) the a GaN-based LED chip 100 comprising a light-transmissive substrate 101 and GaN-based semiconductor layer L formed on the light-transmissive substrate 101, wherein the GaN-based semiconductor layer L has a laminate structure containing n-type layer 102, light emitting layer 103 and p-type layer 104 in this order from the light-transmissive substrate 101 side, wherein a positive electrode E101 is formed on the p-type layer 104, said electrode E101 containing a light-transmissive electrode E101a of an oxide semiconductor and a positive contact electrode E101b electrically connected to the light-transmissive electrode, and the area of the positive contact electrode E101b is less than ½ of the area of the upper surface of the p-type layer 104.
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Citations
5 Claims
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1. A light emitting device wherein a GaN-based LED chip of the following (a) is flip-chip mounted:
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(a) a GaN-based LED chip comprising a light-transmissive substrate and a GaN-based semiconductor layer formed on the light-transmissive substrate, the GaN-based semiconductor layer having a laminate structure comprising an n-type layer, a light emitting layer and a p-type layer in this order from the light-transmissive substrate side, wherein a positive electrode is formed on the p-type layer, said electrode comprising a light-transmissive electrode composed of an oxide semiconductor and a positive contact electrode electrically connected to the light-transmissive electrode, and the area of the positive contact electrode is less than ½
of the area of the upper surface of the p-type layer. - View Dependent Claims (2, 3, 4, 5)
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Specification