MEMS DEVICES HAVING OVERLYING SUPPORT STRUCTURES AND METHODS OF FABRICATING THE SAME

• US 20100019336A1
• Filed: 07/27/2009
• Published: 01/28/2010
• Est. Priority Date: 07/22/2005
• Status: Active Grant

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Qualcomm MEMS Technologies Incorporated (Qualcomm, Inc.)
• Inventors: Chui, Clarence, Miles, Mark W., Kothari, Manish, Sasagawa, Teruo, Ganti, SuryaPrakash, Tung, Ming-Hau
• Granted Patent: US 7,875,485 B2
• Time in Patent Office: Days
• US Class Current: 257/432
• CPC Class Codes: B81B 2201/047 Optical MEMS not provided for in B81B2201/042 - B81B2201/045
• CPC Class Codes: B81B 2203/0307 Anchors
• CPC Class Codes: B81B 2203/053 Translation according to an axis perpendicular to the substrate
• CPC Class Codes: B81B 3/007 For controlling stiffness, e.g. ribs
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.

Claims

1. A method of fabricating an electromechanical device, comprising:

providing a substrate;

depositing an electrode layer over the substrate;

depositing a sacrificial layer over the electrode layer;

patterning the sacrificial layer to form apertures;

depositing a movable layer over the sacrificial layer;

forming support structures overlying the movable layer and at least partially within apertures in the sacrificial layer; and

etching the sacrificial layer to remove the sacrificial layer, thereby forming a cavity between the movable layer and the electrode layer.

2. The method of claim 1, wherein the movable layer includes a mechanical sublayer and a reflective sublayer.

3. The method of claim 2, wherein the mechanical sublayer is formed directly over the reflective sublayer.

4. The method of claim 2, wherein depositing the movable layer over the sacrificial layer comprises:

depositing a reflective sublayer over the sacrificial layer;

patterning the reflective sublayer;

depositing a second sacrificial layer after and over the reflective sublayer; and

depositing a mechanical sublayer after and over the reflective sublayer.

5. The method of claim 2, wherein the reflective sublayer comprises aluminum.

6. The method of claim 2, wherein the movable sublayer comprises at least one material selected from the group of:

nickel and chromium.

7. The method of claim 2, wherein the reflective sublayer is deposited after the patterning of the sacrificial material, additionally comprising removing at least a portion of the reflective layer located along a base of the apertures in the sacrificial layer

8. The method of claim 2, wherein the reflective sublayer is deposited prior to the patterning of the sacrificial material.

9. The method of claim 1, wherein the support structures comprise at least one material selected from the group of:

aluminum, AlO_x, silicon oxide, SiN_x, nickel, and chromium.

10. The method of claim 1, wherein forming the support structures comprises:

depositing a layer of support material over the movable layer and at least partially within the apertures in the sacrificial layer; and

patterning the layer of support material to form support structures located over the apertures.

11. The method of claim 10, additionally comprising:

patterning the sacrificial layer to form annular holes, forming columns of sacrificial material; and

depositing a layer of protective material over the sacrificial material, filling the annular holes with the layer of protective material, wherein the sacrificial material is selectively etchable relative to the protective material.

12. The method of claim 11, additionally comprising etching back the layer of protective material to expose the sacrificial layer, wherein said etching back is done prior to patterning the sacrificial layers to form apertures, and wherein said apertures are formed within the columns of sacrificial material.

13. The method of claim 12, additionally comprising removing the protective material to expose sides of the columns of sacrificial material, wherein the protective material is removed after the sacrificial layer has been etched to form the cavity

14. The method of claim 10, additionally comprising:

forming at least one aperture in the movable layer; and

etching a via through the sacrificial material extending from the at least one aperture in the movable layer to a layer underlying the sacrificial material, wherein the layer of support material fills the via.

15. The method of claim 14, wherein the layer of support material comprises a planarizing material.

16. The method of claim 14, wherein the at least one aperture in the movable layer is formed through a substantially horizontal portion of the movable layer.

17. The method of claim 14, wherein the movable layer comprises sidewalls within the aperture, and wherein the at least one aperture is formed through a sidewall of the movable layer.

18. The method of claim 10, wherein patterning the support layer to form at least one support structure further comprises patterning the support layer to form at least one rib structure located over the movable layer and away from the apertures in the sacrificial material.

19. The method of claim 10, additionally comprising polishing the support layer to reduce the height of the support structure.

20. The method of claim 10, wherein patterning the layer of support material comprises etching the support layer selectively relative to the movable layer.

21. The method of claim 10, wherein the movable layer comprises a substantially flat base portion, additionally comprising etching an aperture through at least a portion of the substantially flat base portion prior to depositing the layer of support material.

22. The method of claim 1, wherein forming the support structures comprises:

depositing a mask over the movable layer;

patterning the mask to define at least one aperture, wherein the aperture is located over one of the apertures in the sacrificial layer; and

forming at least one support structure within the aperture in the mask by a plating process.

23. The method of claim 22, wherein the support structure is formed by an electroplating process.

24. The method of claim 1, wherein depositing the electrode layer over the substrate comprises:

depositing a layer of ITO over the substrate; and

depositing a layer of chromium over the layer of ITO.

25. The method of claim 1, additionally comprising depositing a partially reflective layer over the electrode layer, wherein the movable layer includes a mechanical sublayer and a reflective sublayer, the reflective sublayer located on the side of the movable layer facing the partially reflective layer.

26. The method of claim 1, additionally comprising patterning the electrode layer to form electrode apertures, wherein said electrode apertures are located underneath the apertures in the sacrificial layer.

27. The method of claim 1, additionally comprising depositing a dielectric layer between the electrode layer and the sacrificial material.

28. The method of claim 27, wherein the dielectric layer comprises silicon oxide.

29. The method of claim 1, additionally comprising depositing an adhesion enhancement layer over the movable layer prior to formation of the support structures.

30. The method of claim 1, additionally comprising depositing a protective layer over the support structure prior to etching the sacrificial material.

31. The method of claim 1, additionally comprising patterning the movable layer to form etch holes prior to etching the sacrificial layer.

32. The method of claim 1, additionally comprising forming a first lead in electrical connection with the movable layer, and a second lead in electrical connection with the electrode layer.

33. The method of claim 32, wherein forming the movable layer comprises depositing at least a mechanical layer.

34. The method of claim 33, wherein forming the first lead comprises depositing the mechanical layer on a portion of the substrate extending away from a portion of the mechanical layer overlying the sacrificial layer, and patterning the mechanical layer to form the first lead.

35. The method of claim 33, wherein forming the second lead comprises depositing the mechanical layer over an exposed portion of the electrode layer, and patterning the mechanical layer to form the second lead and to electrically isolate the second lead from a portion of the movable layer overlying the sacrificial material.

36. The method of claim 35, wherein the electrode layer comprises ITO and the mechanical layer comprises nickel, and wherein the nickel is deposited directly over an exposed portion of the ITO.

37. The method of claim 32, wherein forming the support structures comprises depositing a layer of support material, the support material comprising a non-conductive material, and wherein the layer of support material is deposited over at least one of said first and second leads, and remains over at least a portion of said lead to protect said lead.

38. The method of claim 37, wherein the layer of support material is deposited prior to patterning said at least one of said first and second leads.

39. The method of claim 37, wherein the layer of support material is deposited after patterning said at least one of said first and second leads.

40. A MEMS device formed by the method of claim 1.