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REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICE

  • US 20100027107A1
  • Filed: 08/05/2009
  • Published: 02/04/2010
  • Est. Priority Date: 02/05/2007
  • Status: Active Grant
First Claim
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1. A reflective optical element configured for an operating wavelength in at least one of the soft x-ray and extreme ultraviolet wavelength range, comprising:

  • a multilayer system with respective layers of at least two alternating materials having differing real parts of the index of refraction at the operating wavelength, and with at least two additional layers of further material situated adjoining at least one of the two alternating materials, wherein the two additional layers differ respectively at a transition from the material having a lower real part of the index of refraction to the material having a higher real part of the index of refraction and at a transition from the material having a higher real part of the index of refraction to the material having a lower real part of the index of refraction.

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