Electron beam exciter for use in chemical analysis in processing systems

• US 20100032587A1
• Filed: 07/16/2009
• Published: 02/11/2010
• Est. Priority Date: 07/17/2008
• Status: Active Grant

• Current Assignee: Board of Regents of the University of Texas System (University of Texas System), Verity Instruments Incorporated
• Original Assignee: Verity Instruments Incorporated
• Inventors: Harvey, Kenneth C., Hosch, Jimmy W., Whelan, Mike, Goeckner, Matthew J., Kueny, Andrew Weeks, Thamban, P.L. Stephan
• Granted Patent: US 9,997,325 B2
• Time in Patent Office: Days
• US Class Current: 250/492.300
• CPC Class Codes: H01J 37/06 Electron sources; Electron guns electron sources in general H01J1/02, H01J19/02; electron guns in general H01J3/02
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32972 Spectral analysis

Abstract

The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

Claims

84-1. The exhaust line exciter recited in claim 1, wherein a direction of electrons is along the beam axis is substantially opposed to a flow direction of the stream of effluent in the gas conduit.

100. A device for exciting particles in a gas stream comprising:

an electron beam exciter for generating an electron beam along a beam axis, said electron beam having a first concentration of electrons at a first mean electron energy state, said electron beam exciter being coupled to a gas conduit with an interior volume for transporting a gas stream, wherein at least some portion of the beam axis traverses a portion of the interior volume of the gas conduit, said electron beam exciter further comprises;

a reference electrical potential source electrically coupled to electron source for establishing a reference potential at the electron source;

an electron source for generating a second concentration of electrons at a second mean electron energy state, said electron source comprising;

a source chamber with an interior volume for holding the second concentration of electrons at a second mean electron energy state;

an electron emissive material contained within the source chamber for receiving an excitation energy and emitting the second concentration of electrons at the second mean electron energy state; and

an extractor opening for creating a path from the source chamber;

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source;

a variable density excitation energy supply coupled to the electron source for supplying a variable excitation energy to the electron source;

an electron extractor for extracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state, comprising;

an extractor electrode for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source, said extractor electrode comprising;

a first electrode portion, the first electrode portion being substantially transparent to the electrons;

a second electrode portion, said second electrode portion being opaque to the electrons; and

electron beam focusing optics;

a variable energy state extractor voltage supply electrically coupled to the electron extractor for establishing a variable electric extraction charge on the electron extractor;

an electron collector for receiving a quantity of electron strikes from the electron beam and producing an electron current related to the quantity of electron strikes, comprising;

a collector electrode for receiving a collector bias voltage and attracting electrons from the electron beam toward the collector electrode;

a variable energy collector bias voltage supply electrically coupled to the electron collector for establishing a variable electric biasing charge on the electron connector;

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current and regulating the variable excitation energy supplied the electron source based on the magnitude of the current;

a magnetic field source for establishing a magnetic field coaxially with the beam axis; and

an emissions detector for detecting light emissions in the interior volume of the gas conduit, said light emissions being emitted from particles excited by the electron beam.

101. A device for exciting particles in a gas stream comprising:

an electron beam exciter for generating an electron beam along a beam axis, said electron beam having a first concentration of electrons at a first mean electron energy state, said electron beam exciter being coupled to a gas conduit with an interior volume for transporting a gas stream, wherein at least some portion of the beam axis traverses a portion of the interior volume of the gas conduit, said electron beam exciter further comprises;

a reference electrical potential source electrically coupled to electron source for establishing a reference potential at the electron source;

an electron source for generating a second concentration of electrons at a second mean electron energy state, said electron source comprising;

a source chamber with an interior volume for holding the second concentration of electrons at a second mean electron energy state;

an electron emissive material contained within the source chamber for receiving an excitation energy and emitting the second concentration of electrons at the second mean electron energy state;

an extractor opening for creating a path from the source chamber;

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source; and

a gas port coupled to the source chamber and connected to the interior volume;

a variable density excitation energy supply coupled to the electron source for supplying a variable excitation energy to the electron source;

an electron extractor for extracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state, comprising;

an extractor electrode for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source, said extractor electrode comprising;

a first electrode portion, the first electrode portion being substantially transparent to the electrons;

a second electrode portion, said second electrode portion being opaque to the electrons; and

electron beam focusing optics;

a variable energy state extractor voltage supply electrically coupled to the electron extractor for establishing a variable electric extraction charge on the electron extractor;

an electron collector for receiving a quantity of electron strikes from the electron beam and producing an electron current related to the quantity of electron strikes, comprising;

a collector electrode for receiving a collector bias voltage and attracting electrons from the electron beam toward the collector electrode;

a variable energy collector bias voltage supply electrically coupled to the electron collector for establishing a variable electric biasing charge on the electron connector;

a pressure sensor for sensing pressure in the interior volume of the gas conduit and generating pressure information;

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current, and further electrically coupled between the pressure information and the variable excitation energy supply for receiving pressure information and for regulating the variable excitation energy supplied to the electron source based on the magnitude of the current and the pressure information.

a magnetic field source for establishing a magnetic field coaxially with the beam axis; and

an emissions detector for detecting light emissions in the interior volume of the gas conduit, said light emissions being emitted from particles excited by the electron beam.

102. A device for exciting particles in a gas comprising:

an electron source for generating a second concentration of electrons at a second mean electron energy state;

an electron extractor for extracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state; and

an electron collector for receiving a quantity of electron strikes from the electron beam and producing an electron current related to the quantity of electron strikes.

103. The device for exciting particles in a gas recited in claim 102, further comprising:

a reference electrical potential source electrically coupled to electron source for establishing a reference potential at the electron source;

a variable density excitation energy supply coupled to the electron source for supplying a variable excitation energy to the electron source;

a variable energy state extractor voltage supply electrically coupled to the electron extractor for establishing a variable electric extraction charge on the electron extractor; and

a variable energy collector bias voltage supply electrically coupled to the electron collector for establishing a variable electric biasing charge on the electron connector.

104. The device for exciting particles in a gas recited in claim 103, wherein the electron source further comprises:

a source chamber with an interior volume for holding the second concentration of electrons at a second mean electron energy state;

an electron emissive material contained within the source chamber for receiving an excitation energy and emitting the second concentration of electrons at the second mean electron energy state; and

an extractor opening for creating a path from the source chamber.

105. The device for exciting particles in a gas recited in claim 104, wherein the electron source further comprises:

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source.

106. The device for exciting particles in a gas recited in claim 105, wherein the electron extractor further comprises:

an extractor electrode for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source.

107. The device for exciting particles in a gas recited in claim 106, wherein the extractor electrode further comprises:

a first electrode portion, the first electrode portion being substantially transparent to the electrons in the electron beam; and

a second electrode portion, said second electrode portion being opaque to the electrons in the electron beam.

108. The device for exciting particles in a gas recited in claim 107, further comprising:

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current and regulating the variable excitation energy supplied to the electron source based on the magnitude of the current.

109. The device for exciting particles in a gas recited in claim 107, further comprising:

a pressure sensor for sensing pressure in the interior volume of the gas conduit and generating pressure information.

110. The device for exciting particles in a gas recited in claim 109, further comprising:

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current, and further electrically coupled between the pressure information and the variable excitation energy supply for receiving pressure information and for regulating the variable excitation energy supplied to the electron source based on the magnitude of the current and the pressure information.

111. The device for exciting particles in a gas recited in claim 110, further comprising:

a magnetic field source for establishing a magnetic field coaxially with the beam axis.

112. The device for exciting particles in a gas recited in claim 111, further comprising:

an emissions detector for detecting light emissions in the interior volume of the gas conduit, said light emissions being emitted from particles excited by the electron beam.

113. A method for exciting particles in a gas comprising:

generating an electron beam along a beam axis, said electron beam having a first concentration of electrons at a first mean electron energy state;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber; and

receiving light emissions at a first wavelength and a first intensity.

114. The method for exciting particles in a gas recited in claim 113, further comprising:

altering an energy state of the electron beam to a second mean electron energy state; and

receiving light emissions at a second wavelength.

115. The method for exciting particles in a gas recited in claim 113, further comprising:

adjusting a density of electrons in the electron beam to a second concentration of electrons at the first mean electron energy state; and

receiving light emissions at the first wavelength and a second intensity.

116. The method for exciting particles in a gas recited in claim 113, further comprising:

holding a density of electrons in the electron beam constant at the first concentration of electrons;

altering an energy state of the electron beam to a second mean electron energy state; and

receiving light emissions at the second wavelength and a second intensity.

117. The method for exciting particles in a gas recited in claim 116, further comprising:

holding an energy level of the electrons in the electron beam constant at the second mean electron energy state;

adjusting a density of electrons in the electron beam to a second concentration of electrons; and

receiving light emissions at the second wavelength and a third intensity.

118. The method for exciting particles in a gas recited in claim 113, further comprising:

monitoring a density of electrons in the electron beam.

119. The method for exciting particles in a gas recited in claim 118, further comprising:

verifying the density of electrons in the electron beam at the first concentration of electrons.

120. The method for exciting particles in a gas recited in claim 117, further comprising:

detecting the density of electrons in the electron beam at a second concentration of electrons; and

adjusting a density of electrons in the electron beam to the first concentration of electrons.

121. The method for exciting particles in a gas recited in claim 113, further comprising:

holding an energy level of the electrons in the electron beam constant at the first mean electron energy state;

adjusting a density of electrons in the electron beam to a second concentration of electrons at the first mean electron energy state; and

receiving light emissions at the first wavelength and a second intensity.

122. A method for exciting particles in a gas comprising:

generating an electron beam having a first concentration of electrons at a first mean electron energy state;

directing the electron beam at a test gas stream, said test gas stream comprising a first gas; and

monitoring the test gas stream for light emissions.

2. The exhaust line exciter recited in claim 1, wherein the electron beam exciter further comprises:

an electron source for generating a second concentration of electrons at a second mean electron energy state; and

an electron extractor for extracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state.

3. The exhaust line exciter recited in claim 2 further comprising:

a reference electrical potential source electrically coupled to electron source for establishing a reference potential at the electron source; and

an energy state extractor voltage supply electrically coupled to the electron extractor for supplying an electric voltage to the electron extractor to establish an electric extraction charge on the electron extractor.

4. The exhaust line exciter recited in claim 2 further comprising:

a reference electrical potential source electrically coupled to electron source for establishing a reference potential at the electron source; and

a variable energy state extractor voltage supply electrically coupled to the electron extractor for supplying a variable electric voltage to the electron extractor to establish a variable electric extraction charge on the electron extractor.

5. The exhaust line exciter recited in claim 4, wherein the electron source further comprises:

a source chamber;

an electron emissive material contained within the source chamber for receiving an excitation energy and emitting the second concentration of electrons at the second mean electron energy state; and

an extractor opening for creating a path from the source chamber, said extractor opening having an extractor opening diameter.

6. The exhaust line exciter recited in claim 5, wherein the electron emissive material is the effluent from the semiconductor reactor chamber.

7. The exhaust line exciter recited in claim 5, wherein the electron emissive material is an emitter component for the electron source.

8. The exhaust line exciter recited in claim 5, wherein the electron beam exciter further comprises:

a variable density excitation energy supply coupled to the electron source for supplying a variable excitation energy to the electron source.

9. The exhaust line exciter recited in claim 8, wherein the electron source is an inductively coupled plasma type electron source, the electron source further comprises:

an induction coil configured about the source chamber and electrically coupled to the variable density excitation energy, for exciting the effluent from the semiconductor reactor chamber and within the source chamber for emitting the second concentration of electrons at the second mean electron energy state, wherein at least a portion of the source chamber is comprised of a non-conductive material and the variable excitation energy supplied by the variable density excitation energy supply is high frequency electro magnetic waves in the radio frequency range.

10. The exhaust line exciter recited in claim 8, wherein the electron source further comprises:

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source.

11. The exhaust line exciter recited in claim 8, wherein the electron source is a hollow cathode type electron source, the electron source further comprises:

an anode electrically coupled to the variable density excitation energy; and

a hollow cathode electrically coupled to the reference electrical potential source, at least a portion of the hollow cathode being disposed between the anode and the extractor opening for exciting the effluent from the semiconductor reactor chamber and within the source chamber for emitting the second concentration of electrons at the second mean electron energy state, wherein the variable excitation energy supplied by the variable density excitation energy supply is a DC voltage.

12. The exhaust line exciter recited in claim 8, wherein the electron source is a field emitter array type electron source, the electron source further comprises:

a field emitter array coupled to the variable density excitation energy, said field emitter array having a first surface and a plurality of tips disposed thereon the first surface for emitting the second concentration of electrons at the second mean electron energy state, wherein the excitation energy supplied by the variable density excitation energy supply is a DC voltage.

13. The exhaust line exciter recited in claim 12, wherein the electron source further comprises:

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source.

15. The exhaust line exciter recited in claim 8, wherein the electron source is a hot cathode type electron source, the electron source further comprises:

a hot cathode coupled to the variable density excitation energy for thermally emitting the second concentration of electrons at the second mean electron energy state, wherein the excitation energy supplied by the variable density excitation energy supply is a DC current.

16. The exhaust line exciter recited in claim 15, wherein the electron source further comprises:

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source.

17. The exhaust line exciter recited in claim 5, wherein the electron source is a photon emitter type electron source, the electron source further comprises:

a photon emitter coupled to the variable density excitation energy for exciting the effluent from the semiconductor reactor chamber and within the source chamber for emitting the second concentration of electrons at the second mean electron energy state.

18. The exhaust line exciter recited in claim 17, wherein the electron source further comprises:

a reference potential surface proximate to the second concentration of electrons at a second mean electron energy state in the source chamber, thereby enabling the second concentration of electrons at a second mean electron energy state to assume the reference potential of the reference electrical potential source.

19. The exhaust line exciter recited in claim 5, wherein the electron source is a microwave type electron source, the electron source further comprises:

a microwave resonance cavity; and

a magnetron coupled to the variable density excitation energy for exciting the effluent from the semiconductor reactor chamber and within the microwave resonance cavity for emitting the second concentration of electrons at the second mean electron energy state.

20. The exhaust line exciter recited in claim 7, further comprises:

an extractor voltage supply electrically coupled to the electron extractor for supplying an extractor voltage to establish an electric extraction charge on the electron extractor.

21. The exhaust line exciter recited in claim 20, wherein the electron extractor further comprises:

an extractor electrode electrically coupled to the extractor voltage supply for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state.

22. The exhaust line exciter recited in claim 7, further comprises:

a variable energy state extractor voltage supply electrically coupled to the electron extractor for supplying a variable extractor voltage to establish a variable electric extraction charge on the electron extractor.

23. The exhaust line exciter recited in claim 22, wherein the electron extractor further comprises:

an extractor electrode electrically coupled to the variable energy state extractor voltage supply for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state.

24. The exhaust line exciter recited in claim 22, wherein the electron extractor further comprises:

an extractor electrode electrically coupled to the variable energy state extractor voltage supply for receiving an extractor voltage and attracting the second concentration of electrons at the second mean electron energy state from the electron source and accelerating the second concentration of electrons along the beam axis to the first mean electron energy state and accelerating the second concentration of electrons along the beam axis to a third mean electron energy state.

25. The exhaust line exciter recited in claim 24, wherein the electron extractor further comprises:

a first electrode portion, the first electrode portion having a first portion diameter that is substantially aligned with the beam axis and substantially transparent to the electrons of the electron beam.

26. The exhaust line exciter recited in claim 25, wherein the first electrode portion further comprises:

a substantially planar electrode having a plurality of openings.

27. The exhaust line exciter recited in claim 26, wherein the first electrode portion is a screen grid and each of the plurality of openings have a generally rectangular shape.

28. The exhaust line exciter recited in claim 26, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally circular shape.

29. The exhaust line exciter recited in claim 26, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally hexagonal shape.

30. The exhaust line exciter recited in claim 26, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally polygonal shape.

31. The exhaust line exciter recited in claim 26, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally curvilinear shape.

32. The exhaust line exciter recited in claim 24, wherein the electron extractor further comprises:

a first electrode portion, the first electrode portion being substantially transparent to electrons of the electron beam; and

a second electrode portion, said second electrode portion being opaque to the electrons of the electron beam.

33. The exhaust line exciter recited in claim 32, wherein the first electrode portion having a first portion diameter that is substantially aligned with the beam axis and disposed on the electron extractor substantially within the second electrode portion of the electron extractor, the second portion having a second portion diameter that is substantially aligned with the beam axis, wherein the second portion diameter is greater than the first portion diameter.

34. The exhaust line exciter recited in claim 33, wherein the first electrode portion further comprises:

a substantially planar electrode with a plurality of openings and is substantially coaxial with the beam axis.

35. The exhaust line exciter recited in claim 33, wherein the first electrode portion is a screen grid and each of the plurality of openings have a generally rectangular shape.

36. The exhaust line exciter recited in claim 33, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally circular shape.

37. The exhaust line exciter recited in claim 33, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally hexagonal shape.

38. The exhaust line exciter recited in claim 33, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally polygonal shape.

39. The exhaust line exciter recited in claim 33, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally curvilinear shape.

40. The exhaust line exciter recited in claim 33, wherein the first electrode portion is an opening in the second electrode portion.

41. The exhaust line exciter recited in claim 33, wherein the second electrode portion further comprises:

electron beam focusing optics.

42. The exhaust line exciter recited in claim 41, wherein the electron beam focusing optics further comprises:

a conical shaped cross-section disposed on the second electrode portion, said conical shaped cross-section having a cone depth with a concave surface oriented toward the electron beam that is substantially coaxial with the beam axis.

43. The exhaust line exciter recited in claim 42, wherein the concave surface is linear.

44. The exhaust line exciter recited in claim 42, wherein the concave surface is non-linear.

45. The exhaust line exciter recited in claim 42, wherein the cone depth is related to the first portion diameter of the first electrode portion.

46. The exhaust line exciter recited in claim 25, wherein the first electrode portion of the extraction electrode is disposed along the electron beam and separated from the electron source by a first separation distance.

47. The exhaust line exciter recited in claim 46, wherein the first separation distance is related to the extractor opening diameter.

48. The exhaust line exciter recited in claim 46, wherein the extractor opening diameter is greater than the first separation distance.

49. The exhaust line exciter recited in claim 25, further comprising:

an electron collector for receiving a quantity of electron strikes from the electron beam and producing an electron current related to the quantity of electron strikes, said electron collector being substantially aligned with the beam axis and separated from the electron source by a second separation distance.

50. The exhaust line exciter recited in claim 49, further comprising:

a variable energy collector bias voltage supply electrically coupled to the electron collector supplying a variable bias voltage to establish a variable electric bias charge on the electron connector.

51. The exhaust line exciter recited in claim 50, wherein the variable bias voltage is greater than the variable extractor voltage.

52. The exhaust line exciter recited in claim 50, wherein the variable bias voltage is greater than the variable extractor voltage.

53. The exhaust line exciter recited in claim 32, further comprising:

an electron collector for receiving a quantity of electron strikes from the electron beam and producing an electron current related to the quantity of electron strikes, said electron collector being substantially aligned with the beam axis and separated from the electron source by a second separation distance.

54. The exhaust line exciter recited in claim 53, further comprising:

a variable energy collector bias voltage supply electrically coupled to the electron collector supplying a variable bias voltage to establish a variable electric bias charge on the electron connector.

55. The exhaust line exciter recited in claim 54, wherein the variable bias voltage is greater than the variable extractor voltage.

56. The exhaust line exciter recited in claim 55, wherein the variable bias voltage is greater than the variable extractor voltage.

57. The exhaust line exciter recited in claim 53, further comprising:

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current and regulating the variable excitation energy supplied to the electron source based on the magnitude of the current.

58. The exhaust line exciter recited in claim 53, further comprising:

a pressure sensor for sensing pressure in the interior volume of the gas conduit and generating pressure information;

59. The exhaust line exciter recited in claim 58, further comprising:

an electron concentration controller electrically coupled between the electron collector and the variable density excitation energy supply for receiving the electron current, and further electrically coupled between the pressure information and the variable excitation energy supply for receiving pressure information and for regulating the variable excitation energy supplied to the electron source based on the magnitude of the current and the pressure information.

69. The exhaust line exciter recited in claim 48, wherein the first electrode portion further comprises:

a substantially planar electrode with a plurality of openings and is substantially coaxial with the beam axis.

70. The exhaust line exciter recited in claim 69, wherein the first electrode portion is a substrate with an array of the plurality of openings and each of the plurality of openings have a generally polygonal shape.

82. The exhaust line exciter recited in claim 2, wherein the electron source further comprises:

a source chamber having an interior volume;

an electron emissive material contained within the interior volume of the source chamber for receiving an excitation energy and emitting the second concentration of electrons at the second mean electron energy state; and

an extractor opening for creating a path from the source chamber, said extractor opening having an extractor opening diameter.

83. The exhaust line exciter recited in claim 82, wherein the electron source further comprises:

a gas port coupled to the source chamber and connected to an interior volume of the source chamber.

97. The exhaust line exciter recited in claim 24, wherein the first mean electron energy state is related to an excited energy level for exciting a first target gas in the effluent to an energy state capable of undergoing emission relaxation at a first wavelength.

98. The exhaust line exciter recited in claim 97, wherein the third mean electron energy state is related to an excited energy level for exciting the first target gas in the effluent to a second mean electron energy state capable of undergoing emission relaxation at a second wavelength.

99. The exhaust line exciter recited in claim 97, wherein the third mean electron energy state is related to an excited energy level for exciting a second target gas in the effluent to an energy state capable of undergoing emission relaxation at a third wavelength.

123. The method for exciting particles in a gas recited in claim 122, further comprising:

detecting light emissions from the first gas at a first emission wavelength; and

recording a light emission profile for the first gas at the first mean electron energy state, said light emission profile comprises the first emission wavelength.

124. The method for exciting particles in a gas recited in claim 122, further comprising:

detecting light emissions from the first gas at a first emission wavelength and a second emission wavelength; and

recording a light emission profile for the first gas excitation at the first mean electron energy state, said light emission profile comprises the first emission wavelength and the second emission wavelength.

125. The method for exciting particles in a gas recited in claim 124, further comprising:

altering an energy state of the electron beam to a second mean electron energy state;

detecting light emissions from the first gas at a third emission wavelength; and

recording a second light emission profile for the first gas at the second mean electron energy state, said second light emission profile comprises the third emission wavelength.

126. The method for exciting particles in a gas recited in claim 124, further comprising:

altering an energy state of the electron beam to a second mean electron energy state;

detecting light emissions from the first gas at a third emission wavelength and a fourth emission wavelength; and

recording a second light emission profile for the first gas at the second mean electron energy state, said second light emission profile compromises the third emission wavelength and the fourth emission wavelength.

127. The method for exciting particles in a gas recited in claim 125, further comprising:

terminating the test gas stream comprising the first gas;

providing a second test gas stream, said second test gas stream comprising a second gas;

directing the electron beam at the second test gas stream; and

monitoring the second test gas stream for light emissions.

128. The method for exciting particles in a gas recited in claim 127, further comprising:

detecting light emissions from the second gas at a fifth emission wavelength; and

recording a light emission profile for the second gas at the first mean electron energy state, said light emission profile comprises the fifth emission wavelength.

129. The method for exciting particles in a gas recited in claim 127, further comprising:

detecting light emissions from the second gas at a fifth emission wavelength and a sixth emission wavelength; and

recording a light emission profile for the second gas at the first mean electron energy state, said light emission profile comprises the fifth emission wavelength and the sixth emission wavelength.

130. The method for exciting particles in a gas recited in claim 131, further comprising:

altering an energy state of the electron beam to a second mean electron energy state;

detecting light emissions from the second gas at a seventh emission wavelength; and

recording a second light emission profile for the second gas at the second mean electron energy state, said second light emission profile compromises the seventh emission wavelength.

131. The method for exciting particles in a gas recited in claim 129, further comprising:

altering an energy state of the electron beam to a second mean electron energy state;

detecting light emissions from the second gas at a seventh emission wavelength and an eighth emission wavelength; and

recording a second light emission profile for the second gas at the second mean electron energy state, said second light emission profile comprises the seventh emission wavelength and the eighth emission wavelength.

132. The method for exciting particles in a gas recited in claim 125, further comprising:

compiling the first light emission profile and the second light emission profile into a second unique spectral signature for the second gas.

133. The method for exciting particles in a gas recited in claim 132, further comprising:

creating a library of light emission profiles for gases from test gas streams.

134. The method for exciting particles in a gas recited in claim 133, further comprising:

creating a library of unique spectral signatures for gases from test gas streams of the unique spectral signature and the second unique spectral signature.

135. The method for exciting particles in a gas recited in claim 134, further comprising:

generating a second electron beam along a beam axis, said electron beam having a second first concentration of electrons at the first electron energy state;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber; and

receiving light emissions at the first emission wavelength; and

identifying the first gas as being present in the stream of effluent.

136. The method for exciting particles in a gas recited in claim 134, further comprising:

generating a second electron beam along a beam axis, said second electron beam having a second concentration of electrons at the first electron energy state;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber;

receiving light emissions at one of the first emission wavelength and the second emissions wavelength; and

identifying the first gas as being present in the stream of effluent.

137. The method for exciting particles in a gas recited in claim 126, further comprising:

generating a second electron beam along a beam axis, said second electron beam having a second concentration of electrons at the second mean electron energy state;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber;

receiving light emissions at the third emission wavelength; and

identifying the first gas as being present in the stream of effluent.

138. The method for exciting particles in a gas recited in claim 131, further comprising:

generating a second electron beam along a beam axis, said second electron beam having a second concentration of electrons at the second mean electron energy state;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber;

receiving light emissions at the seventh emission wavelength and the eighth emission; and

identifying the second gas as being present in the stream of effluent.

139. The method for exciting particles in a gas recited in claim 135, further comprising:

receiving light emissions at a plurality of emission wavelengths;

comparing the received light emissions to the library of light emission profiles;

matching a set of emission wavelengths to a light emission profile from the library of light emission profiles; and

identifying a target gas present from the matching light emission profile.

140. The method for exciting particles in a gas recited in claim 135, further comprising:

receiving light emissions at a plurality of emission wavelengths at the first electron energy state;

receiving second light emissions at a second plurality of emission wavelengths at the second electron energy state;

comparing the received light emissions and the second received light emissions to the library of unique spectral signatures;

matching a set of emission wavelengths to a unique spectral signature from the library of unique spectral signatures; and

identifying a target gas present from the matching unique spectral signature.

149. The method for exciting particles in a gas recited in claim 123, wherein generating an electron beam having a first concentration of electrons at a first mean electron energy state, further comprises:

providing a first excitation energy level to an electron source;

establishing a reference potential at the electron source;

providing a first extractor voltage to an electron extractor, wherein the first extractor voltage is greater than the reference potential;

generating an electron beam along a beam axis, said electron beam having a first concentration of electrons, based on the first excitation energy level, at the first electron energy state, based on the first extractor voltage;

providing a first bias collector voltage to an electron collector, wherein the first bias collector voltage extractor voltage is greater than the extractor voltage; and

measuring a first electron current from said electron collector.

150. The method for exciting particles in a gas recited in claim 149, wherein providing a first bias collector voltage to an electron collector, wherein the first bias collector voltage extractor voltage is greater than the extractor voltage, further comprises:

adjusting the first bias collector voltage to a second collector bias voltage;

measuring a null electron current from said electron collector;

recording the second collector bias voltage as the first mean electron energy state for exciting the first emission wavelength from the first gas.

151. The method for exciting particles in a gas recited in claim 149, further comprises:

terminating the test gas stream comprising the first gas;

providing the first excitation energy level to the electron source;

providing the second bias collector voltage to the electron collector;

measuring a second electron current from the electron collector;

providing a second extractor voltage to the electron extractor;

measuring a null electron current from said electron collector;

adjusting the second bias collector voltage to the electron collector to the first collector bias voltage;

providing a stream of effluent;

monitoring the stream of effluent for light emissions.

152. The exhaust line exciter recited in claim 3, further comprising:

a heater thermally coupled to the electron extractor and the reference electrical potential source.

153. The exhaust line exciter recited in claim 49, further comprising:

a heater thermally coupled to the electron extractor, the reference electrical potential source and the electron collector.

154. The exhaust line exciter recited in claim 153, further comprising:

a temperature sensor thermally coupled to one of the electron extractor, the reference electrical potential source and the electron collector.

155. The exhaust line exciter recited in claim 154, further comprising:

a heater power supply for supplying electrical power to the heater; and

temperature regulator for receiving temperature information form the temperature sensor and adjusting the electrical power from the heater power supply.

156. The method for exciting particles in a gas recited in claim 149, further comprises:

receiving emission light intensity information for the light emissions;

normalizing the emission light intensity to the electron current.

157. The exhaust line exciter recited in claim 8, wherein the electron source is a corona discharge type electron source, the electron source further comprises:

an electrode coupled to the variable density excitation energy, said electrode have one of a wire end, point or narrow gauge wire body for emitting the second concentration of electrons at the second mean electron energy state, wherein the excitation energy supplied by the variable density excitation energy supply is a DC voltage.

126-2. The method for exciting particles in a gas recited in claim 125, further comprising:

compiling the first light emission profile and the second light emission profile into a unique spectral signature for the first gas.

141. A method for exciting particles in a gas comprising:

providing a first excitation energy level to an electron source;

establishing a reference potential at the electron source;

providing a first extractor voltage to an electron extractor, wherein the first extractor voltage is greater than the reference potential;

generating an electron beam along a beam axis, said electron beam having a first concentration of electrons, based on the first excitation energy level, at the first electron energy state, based on the first extractor voltage;

directing the beam axis toward an interior volume of a gas conduit for transporting a stream of effluent from the semiconductor reactor chamber; and

monitoring the stream of effluent for light emissions.

142. The method for exciting particles in a gas recited in claim 141, further comprising:

adjusting the first excitation energy level to an electron source to a second excitation energy; and

adjusting a density of electrons in the electron beam to a second concentration of electrons.

143. The method for exciting particles in a gas recited in claim 141, further comprising:

altering the first extractor voltage to an electron extractor to a second extractor voltage; and

altering an energy state of the electron beam to a second mean electron energy state.

144. The method for exciting particles in a gas recited in claim 141, further comprising:

providing a first collector bias voltage to an electron collector, wherein the first collector bias voltage is greater than the first extractor voltage.

145. The method for exciting particles in a gas recited in claim 144, further comprising:

altering the first extractor voltage to an electron extractor to a second extractor voltage; and

altering the first collector bias voltage to the electron collector to a second collector bias voltage, wherein the second collector bias voltage is greater than the second extractor voltage.

146. The method for exciting particles in a gas recited in claim 141, further comprising:

exciting particles in the stream of effluent to emit a light;

spatially resolving light intensities along a beam axis of the electron beam to a location along the electron beam; and

wherein monitoring the stream of effluent for light emissions, further comprises monitoring the location along the electron beam.

147. The method for exciting particles in a gas recited in claim 141, further comprising:

exciting particles in the stream of effluent to emit a light; and

spatially resolving light intensities along the stream of effluent to a downstream location from the electron beam; and

wherein monitoring the stream of effluent for light emissions further comprises monitoring the downstream location from the electron beam.

148. The method for exciting particles in a gas recited in claim 144, further comprising:

terminating the first extractor voltage to an electron extractor;

terminating the first excitation energy level to an electron source; and

altering the first collector bias voltage to the electron collector to a second collector bias voltage, wherein the second collector bias voltage is less than the reference potential.