×

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

  • US 20100039629A1
  • Filed: 07/21/2009
  • Published: 02/18/2010
  • Est. Priority Date: 02/06/2007
  • Status: Active Grant
First Claim
Patent Images

1. An illumination system having a pupil surface, the illumination system comprising:

  • an essentially flat arrangement of beam deviating elements configured to variably illuminate the pupil surface of the illumination system, each beam deviating element configured to allow deviation of a projection light beam incident thereon in response to a control signal applied to the beam deviating element; and

    a measurement illumination instrument configured to direct a measurement light beam independent of the projection light beams onto a beam deviating element;

    a detector instrument configured to record the measurement light beam after deviation by the beam deviating element; and

    an evaluation unit to determine the deviation of the projection light beam from measurement signals provided by the detector instrument,wherein the illumination system is configured to be used in a microlithographic projection exposure apparatus.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×