METHOD OF ONLINE PREDICTING MAINTENANCE OF AN APPARATUS
First Claim
1. A method of online predicting maintenance of an apparatus having a chamber and an optical emission spectrometer (OES) mounted on a side wall of the chamber, comprising:
- step A of detecting information on intensity of spectrum emitted during dry clean process of the chamber, by using the OES;
step B of quantifying a process parameter in the process based on an analysis of detected information on spectrum intensity; and
obtaining a changing trend of the process parameter by statistically analyzing the process parameters obtained by detecting and quantifying many times; and
step C of performing a maintenance operation when a value of the process parameter exceeds a control threshold set according to a requirement of the process to the apparatus.
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Abstract
A method of online predicting maintenance of an apparatus is disclosed. Using an optical emission spectroscopy (OES) positioned on the apparatus and the change of emission spectrum intensity detected by the OES in the process, according to the detected results, measuring the parameter in the process, the function relation between the process parameter and spectrum intensity is acquired. A control threshold is decided by the processing requirement to the apparatus. When the parameter exceeds the control threshold, maintenance to the etching apparatus is engaged in order to avoid processing error caused by frequent shutdown or deficient maintenance which is estimated by experience, and hence decreasing the cost and increasing processing efficiency of substrates (such as silicon wafers) without changing apparatus and adding other online sensor, and improving production rate by avoiding waste substrates caused by error processing results. The method is suitable for semiconductor substrate etching maintenance of the apparatus and also other maintenance of the apparatus.
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Citations
8 Claims
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1. A method of online predicting maintenance of an apparatus having a chamber and an optical emission spectrometer (OES) mounted on a side wall of the chamber, comprising:
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step A of detecting information on intensity of spectrum emitted during dry clean process of the chamber, by using the OES; step B of quantifying a process parameter in the process based on an analysis of detected information on spectrum intensity; and
obtaining a changing trend of the process parameter by statistically analyzing the process parameters obtained by detecting and quantifying many times; andstep C of performing a maintenance operation when a value of the process parameter exceeds a control threshold set according to a requirement of the process to the apparatus. - View Dependent Claims (2, 3, 4, 5)
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6. A method of online predicting maintenance of an apparatus having a chamber and an optical emission spectrometer (OES) mounted on a side wall of the chamber, comprising:
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step A of detecting information on intensity of spectrum emitted during dry clean process, by using the OES; step B of quantifying a process parameter in the process based on an analysis of detected information on spectrum intensity; and
obtaining a changing trend of the process parameter by statistically analyzing the process parameters obtained by detecting and quantifying many times; andstep C of performing a maintenance operation when a value of the process parameter exceeds a control threshold set according to a requirement of the process to the apparatus; Wherein, said step A comprises; step A2 of detecting a changing trend of the intensity of the emitted spectrum with increasing of number of substrates being processed during the process, by using the OES. - View Dependent Claims (7, 8)
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Specification