Metal Deposition
First Claim
Patent Images
1. A method for fabricating a current-carrying formation, the method comprising:
- providing a voltage switchable dielectric material having a characteristic voltage;
applying a contact mask to a surface of the voltage switchable dielectric material, the contact mask including;
an insulating foot that contacts the surface and defines a portion of the surface for deposition, andan electrode, separated from the surface by the foot;
immersing the voltage switchable dielectric material and applied contact mask in a solution that provides a source of ions associated with an electrical conductor to the defined portion; and
depositing the electrical conductor onto the defined portion of the surface of the voltage switchable dielectric material.
5 Assignments
0 Petitions
Accused Products
Abstract
Systems and methods include depositing one or more materials on a voltage switchable dielectric material. In certain aspects, a voltage switchable dielectric material is disposed on a conductive backplane. In some embodiments, a voltage switchable dielectric material includes regions having different characteristic voltages associated with deposition thereon. Some embodiments include masking, and may include the use of a removable contact mask. Certain embodiments include electrografting. Some embodiments include an intermediate layer disposed between two layers.
-
Citations
26 Claims
-
1. A method for fabricating a current-carrying formation, the method comprising:
-
providing a voltage switchable dielectric material having a characteristic voltage; applying a contact mask to a surface of the voltage switchable dielectric material, the contact mask including; an insulating foot that contacts the surface and defines a portion of the surface for deposition, and an electrode, separated from the surface by the foot; immersing the voltage switchable dielectric material and applied contact mask in a solution that provides a source of ions associated with an electrical conductor to the defined portion; and depositing the electrical conductor onto the defined portion of the surface of the voltage switchable dielectric material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A method for fabricating a current-carrying formation, the method comprising:
-
providing an electrically conductive material on a voltage switchable dielectric material having a characteristic voltage; applying a contact mask to a surface of the electrically conductive material, the contact mask including; an insulating foot that contacts the surface and defines a portion of the surface for etching, and an electrode, separated from the surface by the foot; immersing the voltage switchable dielectric material, deposited electrically conductive material and applied contact mask in an electrochemical etching solution; and etching the electrically conductive material from the defined portion of the surface. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
-
-
25. A current-carrying formation fabricated using a method comprising:
-
providing a voltage switchable dielectric material having a characteristic voltage; applying a contact mask to a surface of the voltage switchable dielectric material, the contact mask including; an insulating foot that contacts the surface and defines a portion of the surface for deposition, and an electrode, separated from the surface by the foot; immersing the voltage switchable dielectric material and applied contact mask in a solution that provides a source of ions associated with an electrical conductor to the defined portion; and depositing the electrical conductor onto the defined portion of the surface of the voltage switchable dielectric material.
-
-
26. A current-carrying formation fabricated using a method comprising:
-
providing an electrically conductive material on a voltage switchable dielectric material having a characteristic voltage; applying a contact mask to a surface of the electrically conductive material, the contact mask including; an insulating foot that contacts the surface and defines a portion of the surface for etching, and an electrode, separated from the surface by the foot; immersing the voltage switchable dielectric material, deposited electrically conductive material and applied contact mask in an electrochemical etching solution; and etching the electrically conductive material from the defined portion of the surface.
-
Specification